The award ceremony was held on November 18, 2025, during the productronica trade fair in Munich, Germany. ACM Research Chairman Wang Hui, North American Sales VP Jim Straus, and European CTO Sallyann Henry attended the ceremony and accepted this international honor, highlighting the company's continued progress in providing cutting-edge cleaning solutions for advanced packaging technologies.
ACM Research General Manager Wang Jian stated :
"We are deeply honored that our globally proprietary Ultra C vac-p has won the 2025 Global Technology Awards in the Cleaning Equipment category. Driven by artificial intelligence, data centers, and autonomous vehicles, emerging fan-out panel-level packaging technology can improve computing power, reduce latency, and increase bandwidth. This technology is rapidly becoming a critical solution, integrating multiple chips, passive components, and interconnects into a single package on a panel, providing greater flexibility, scalability, and cost-effectiveness. This award reflects ACM Research's commitment to providing professional cleaning solutions to address the severe challenges in panel-level packaging." Ultra C vac-p, with its vacuum technology and proprietary IPA drying process, ensures process precision and reliability, helping manufacturers improve yield and device performance.
Launched in July 2024, Ultra C vac-p, an advanced flux cleaning technology for panel-level packaging addresses a key technical challenge in advanced packaging: flux residue removal before underfill. Built on ACM Research's proven platform in wafer-level packaging and high-bandwidth memory cleaning, this equipment aims to help manufacturers transitioning to panel-level packaging effectively reduce costs and improve yield.
Traditional flux cleaning methods often perform poorly with small bump pitches and large chips due to surface tension effects and insufficient liquid penetration. Ultra C vac-p utilizes vacuum technology to enhance the penetration of the cleaning liquid, helping it reach various gaps in large panel substrates and creating conditions for comprehensive and uniform cleaning. Combined with ACM Research's proprietary IPA drying technology, the system provides a complete cleaning process that effectively removes residues and reduces voids that could impair device performance.
As the industry rapidly moves towards more complex 2.5D and 3D architectures, Ultra C vac-p has demonstrated stable cleaning performance in complex panel designs and chip applications. Its superior performance further solidifies ACM Research's industry reputation for providing high-precision, high-reliability cleaning solutions for next-generation advanced packaging. This recognition of Ultra C vac-p,
leading the future of advanced packaging cleaning technology reflects ACM Research's unwavering commitment to improving advanced packaging cleaning technologies to support global semiconductor manufacturers in achieving higher yields, lower operating costs, and scalable growth.
While ACM Research continues to expand its advanced packaging portfolio, the company remains focused on developing solutions that meet increasingly demanding process and performance requirements, providing robust support for the realization of next-generation device architectures through reliable, high-precision cleaning technologies.