A new thread for the Chinese semiconductor sector.
Current state of the sector as of 2024-01 (@tphuang please correct the following if there are errors)
2024-07-06 Update
SMIC, at the company’s new Jingcheng facility on the industrial outskirts of Beijing, is aggressively incorporating homegrown semiconductor-production equipment into its manufacturing line. Meanwhile, it is cutting back on its longtime reliance on industry-leading American tools
…
SMIC is on a path to commercialization. It is now capable of producing chips as advanced as 28-nanometer circuits at this line, and recent output volume there is already beyond the pilot production level
国产EUV光刻机的进展
截至目前,国产EUV光刻机的研发取得了一定的进展:
28nm浸没式光刻机:SMEE于2023年12月成功研发出28nm浸没式光刻机,并交付给中芯国际。
7nm光刻机:SMEE计划在2027年实现7nm光刻机的量产。
Translation:
EUV development is progressing
SMEE successfully developed 28nm immersion DUV on December 2023 and delivered to SMIC
SMEE plans to mass produce 7nm immersion DUV in 2027.
Current state of the sector as of 2024-01 (@tphuang please correct the following if there are errors)
- Huawei’s Kirin 9000s is likely being manufactured by SMIC
- SMEE‘s 28nm capable lithography machine rumour to be in acceptance test with SMIC and other semiconductor manufacturer.
- 45-55nm de-Americanized production lines rumoured to be in operation.
- Components of EUV lithography machine (LPP tin drop generator, CO2 laser, mirrors, etc) have been developed.
- YMTC is producing 232-layer NAND memory. Production volume is unknown.
- Many Fabs for older nodes are being built in China.
2024-07-06 Update
SMIC, at the company’s new Jingcheng facility on the industrial outskirts of Beijing, is aggressively incorporating homegrown semiconductor-production equipment into its manufacturing line. Meanwhile, it is cutting back on its longtime reliance on industry-leading American tools
…
SMIC is on a path to commercialization. It is now capable of producing chips as advanced as 28-nanometer circuits at this line, and recent output volume there is already beyond the pilot production level
国产EUV光刻机的进展
截至目前,国产EUV光刻机的研发取得了一定的进展:
28nm浸没式光刻机:SMEE于2023年12月成功研发出28nm浸没式光刻机,并交付给中芯国际。
7nm光刻机:SMEE计划在2027年实现7nm光刻机的量产。
Translation:
EUV development is progressing
SMEE successfully developed 28nm immersion DUV on December 2023 and delivered to SMIC
SMEE plans to mass produce 7nm immersion DUV in 2027.
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