A new thread for the Chinese semiconductor sector.
Current state of the sector as of 2024-01 (@tphuang please correct the following if there are errors)
2024-07-06 Update

SMIC, at the company’s new Jingcheng facility on the industrial outskirts of Beijing, is aggressively incorporating homegrown semiconductor-production equipment into its manufacturing line. Meanwhile, it is cutting back on its longtime reliance on industry-leading American tools
…
SMIC is on a path to commercialization. It is now capable of producing chips as advanced as 28-nanometer circuits at this line, and recent output volume there is already beyond the pilot production level
国产EUV光刻机的进展
截至目前,国产EUV光刻机的研发取得了一定的进展:
28nm浸没式光刻机:SMEE于2023年12月成功研发出28nm浸没式光刻机,并交付给中芯国际。
7nm光刻机:SMEE计划在2027年实现7nm光刻机的量产。
Translation:
EUV development is progressing
SMEE successfully developed 28nm immersion DUV on December 2023 and delivered to SMIC
SMEE plans to mass produce 7nm immersion DUV in 2027.
2025-01-07 Update
From @Wahid145
From @tokenanalyst

Current state of the sector as of 2024-01 (@tphuang please correct the following if there are errors)
- Huawei’s Kirin 9000s is likely being manufactured by SMIC
- SMEE‘s 28nm capable lithography machine rumour to be in acceptance test with SMIC and other semiconductor manufacturer.
- 45-55nm de-Americanized production lines rumoured to be in operation.
- Components of EUV lithography machine (LPP tin drop generator, CO2 laser, mirrors, etc) have been developed.
- YMTC is producing 232-layer NAND memory. Production volume is unknown.
- Many Fabs for older nodes are being built in China.
2024-07-06 Update

SMIC, at the company’s new Jingcheng facility on the industrial outskirts of Beijing, is aggressively incorporating homegrown semiconductor-production equipment into its manufacturing line. Meanwhile, it is cutting back on its longtime reliance on industry-leading American tools
…
SMIC is on a path to commercialization. It is now capable of producing chips as advanced as 28-nanometer circuits at this line, and recent output volume there is already beyond the pilot production level
国产EUV光刻机的进展
截至目前,国产EUV光刻机的研发取得了一定的进展:
28nm浸没式光刻机:SMEE于2023年12月成功研发出28nm浸没式光刻机,并交付给中芯国际。
7nm光刻机:SMEE计划在2027年实现7nm光刻机的量产。
Translation:
EUV development is progressing
SMEE successfully developed 28nm immersion DUV on December 2023 and delivered to SMIC
SMEE plans to mass produce 7nm immersion DUV in 2027.
2025-01-07 Update
From @Wahid145
From @tokenanalyst

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