"The latest results of the pilot line of domestic immersion deep ultraviolet lithography machine: short-stroke positioning accuracy is 2nm, medium-stroke positioning accuracy is 3nm, and long-stroke positioning accuracy is 5nm"
Can anybody comment on how that translates to node size for HVM? What positioning accuracy does the 1980Di have? I could not find anything via quick Google searches deciphering the implications of this.
Can anybody comment on how that translates to node size for HVM? What positioning accuracy does the 1980Di have? I could not find anything via quick Google searches deciphering the implications of this.