Zhongke Chuangxing leads the investment in advanced electronic materials developer "Anchu Technology"
Zhangjiagang Anchu Technology Co., Ltd. (hereinafter referred to as "Anchu Technology") announced that it has completed the Pre-A round of financing. This round of financing was led by Zhongke Chuangxing, followed by Tianhui Capital and Zhangjiagang Smart Venture Capital. The funds will be used for production capacity expansion and equipment research and development .
" Anchu Technology " was established in 2020, focusing on the research and development, production and sales of advanced electronic materials. Its main products are formulated functional electronic chemicals ( such as polishing fluid, cleaning fluid, wet etching fluid, photoresist stripping fluid etc.) and electronic special gas safe storage negative pressure cylinders.
The core members of the company include doctors and professionals with many years of experience in R&D and production from internationally renowned materials companies. They have many years of experience in advanced process nodes and polishing and cleaning of various material surfaces. With the vision of becoming China's leading electronic materials platform, we are committed to providing The semiconductor field provides better polishing and cleaning solutions and more advanced electronic materials.
In the polishing and cleaning of silicon carbide substrates," Anchu Technology " has consumable products for the entire process including polishing fluid, post-polishing wafer cleaning fluid, and post-polishing machine polishing pad cleaning fluid. Compared with traditional solutions," Anchu Technology " 's product performance is better and its cost is more competitive.
In terms of silicon carbide substrate polishing fluid, international manufacturers such as Fujimi, Ferro, Cabot , and Saint -Gobain currently occupy most of the global market. These manufacturers generally use alumina as abrasive particles.
" Anchu Technology " innovatively uses metal oxides as abrasive particles. Its ACTL-WS series polishing fluid not only has a high polishing rate, but also can obtain a low surface roughness and low-defect wafer surface. Moreover, the polishing fluid can be recycled, reducing customer usage costs.
Regarding the wafer cleaning solution after polishing, potassium permanganate, polishing particles, debris and other contaminants remaining on the wafer surface contaminate the silicon carbide surface to a higher degree than silicon. In addition, the traditional RCA process has a long cleaning process and high process requirements." Anchu Technology " 's WK series cleaning fluid is a formula cleaning fluid specially designed for the above scenarios. It uses one-step cleaning, which reduces the cleaning process. It has good cleaning effect and can effectively remove organic matter and particles and other pollutants on the wafer surface.
In addition, in terms of cleaning fluid for the machine polishing pad after polishing the silicon carbide substrate,The PK series post-polishing machine polishing pad cleaning fluid developed by " Anchu Technology " can effectively clean the residue after polishing. It has excellent cleaning performance, short cleaning time, and can be diluted to reduce customer costs.
Based on many years of experience in semiconductor material development, post-CMP cleaning of silicon-based processes" Anchu Technology " has also developed a series of cleaning products. In the semiconductor manufacturing process, defects such as abrasive particles, organic matter, and metal ions are likely to occur on the surface after chemical mechanical polishing (CMP) . Special functional chemical cleaning is required to reduce defects and improve yield, which is a necessary step in chip production.
"Anchu Technology " has developed a series of PCMP post-polishing cleaning products. The products cover the 130nm to 5nm process and are suitable for cleaning after polishing of different materials, such as copper, cobalt, tungsten and silicon oxide surfaces.
In the field of copper etching solutions, Korean manufacturers occupy a mainstream position. However, their products have difficulties in maintaining a stable taper angle and cleaning residues.The copper etching solution developed by " Anchu Technology " does not contain fluoride ions, is environmentally friendly and safe, can accurately control the etching rate and etching angle of copper, has no chamfering, and has no residue residue. The product has a longer service life and can be used in a longer period of time. Excellent etching performance can be maintained under high copper ion concentration.
In the field of high-end photoresist strippers, most of them are imported products. The difficulty is that when the thickness of the photoresist is larger, it is difficult for traditional photoresist strippers to completely remove it without damaging other contact materials." Anchu Technology's " high-efficiency and low-cost formulated photoresist stripper can effectively remove various photoresists without etching or eroding other exposed materials. It is not only suitable for advanced semiconductor chips, but also for LCD, LED, and flat-panel displays. .
In the field of electronic special gas negative pressure storage cylinders, the American company Entegris occupies more than 85% of the global market share, and most of the related products of domestic manufacturers are produced for their own use. The electronic special gas negative pressure storage cylinder developed by "Anchu Technology" is filled with porous materials with high specific surface area, including phosphine (PH3) and arsane (AsH3) , boron trifluoride (BF3) , and germanium tetrafluoride (GeF4). The isoelectronic special gas has a high adsorption capacity, is stable and safe to store, will not affect the purity of the gas, and has a high release volume. After testing, the product has fully reached the level of imported products in terms of various performance indicators.
" Anchu Technology " was established in 2020, focusing on the research and development, production and sales of advanced electronic materials. Its main products are formulated functional electronic chemicals ( such as polishing fluid, cleaning fluid, wet etching fluid, photoresist stripping fluid etc.) and electronic special gas safe storage negative pressure cylinders.
The core members of the company include doctors and professionals with many years of experience in R&D and production from internationally renowned materials companies. They have many years of experience in advanced process nodes and polishing and cleaning of various material surfaces. With the vision of becoming China's leading electronic materials platform, we are committed to providing The semiconductor field provides better polishing and cleaning solutions and more advanced electronic materials.
In the polishing and cleaning of silicon carbide substrates," Anchu Technology " has consumable products for the entire process including polishing fluid, post-polishing wafer cleaning fluid, and post-polishing machine polishing pad cleaning fluid. Compared with traditional solutions," Anchu Technology " 's product performance is better and its cost is more competitive.
In terms of silicon carbide substrate polishing fluid, international manufacturers such as Fujimi, Ferro, Cabot , and Saint -Gobain currently occupy most of the global market. These manufacturers generally use alumina as abrasive particles.
" Anchu Technology " innovatively uses metal oxides as abrasive particles. Its ACTL-WS series polishing fluid not only has a high polishing rate, but also can obtain a low surface roughness and low-defect wafer surface. Moreover, the polishing fluid can be recycled, reducing customer usage costs.
Regarding the wafer cleaning solution after polishing, potassium permanganate, polishing particles, debris and other contaminants remaining on the wafer surface contaminate the silicon carbide surface to a higher degree than silicon. In addition, the traditional RCA process has a long cleaning process and high process requirements." Anchu Technology " 's WK series cleaning fluid is a formula cleaning fluid specially designed for the above scenarios. It uses one-step cleaning, which reduces the cleaning process. It has good cleaning effect and can effectively remove organic matter and particles and other pollutants on the wafer surface.
In addition, in terms of cleaning fluid for the machine polishing pad after polishing the silicon carbide substrate,The PK series post-polishing machine polishing pad cleaning fluid developed by " Anchu Technology " can effectively clean the residue after polishing. It has excellent cleaning performance, short cleaning time, and can be diluted to reduce customer costs.
Based on many years of experience in semiconductor material development, post-CMP cleaning of silicon-based processes" Anchu Technology " has also developed a series of cleaning products. In the semiconductor manufacturing process, defects such as abrasive particles, organic matter, and metal ions are likely to occur on the surface after chemical mechanical polishing (CMP) . Special functional chemical cleaning is required to reduce defects and improve yield, which is a necessary step in chip production.
"Anchu Technology " has developed a series of PCMP post-polishing cleaning products. The products cover the 130nm to 5nm process and are suitable for cleaning after polishing of different materials, such as copper, cobalt, tungsten and silicon oxide surfaces.
In the field of copper etching solutions, Korean manufacturers occupy a mainstream position. However, their products have difficulties in maintaining a stable taper angle and cleaning residues.The copper etching solution developed by " Anchu Technology " does not contain fluoride ions, is environmentally friendly and safe, can accurately control the etching rate and etching angle of copper, has no chamfering, and has no residue residue. The product has a longer service life and can be used in a longer period of time. Excellent etching performance can be maintained under high copper ion concentration.
In the field of high-end photoresist strippers, most of them are imported products. The difficulty is that when the thickness of the photoresist is larger, it is difficult for traditional photoresist strippers to completely remove it without damaging other contact materials." Anchu Technology's " high-efficiency and low-cost formulated photoresist stripper can effectively remove various photoresists without etching or eroding other exposed materials. It is not only suitable for advanced semiconductor chips, but also for LCD, LED, and flat-panel displays. .
In the field of electronic special gas negative pressure storage cylinders, the American company Entegris occupies more than 85% of the global market share, and most of the related products of domestic manufacturers are produced for their own use. The electronic special gas negative pressure storage cylinder developed by "Anchu Technology" is filled with porous materials with high specific surface area, including phosphine (PH3) and arsane (AsH3) , boron trifluoride (BF3) , and germanium tetrafluoride (GeF4). The isoelectronic special gas has a high adsorption capacity, is stable and safe to store, will not affect the purity of the gas, and has a high release volume. After testing, the product has fully reached the level of imported products in terms of various performance indicators.
