Anfu Technology is establishing a joint venture with Hangzhou Huashengmai and core management teams to specifically target the R&D, verification, and industrialization of core components for semiconductor lithography light sources. This initiative directly addresses a critical "chokepoint" in domestic chip manufacturing: lithography light sources act as the "heart" of lithography machines but have long been monopolized by overseas suppliers such as ASML. By localizing these components, the venture aims to break foreign technical and after-sales restrictions, secure supply chain resilience for Chinese wafer fabs, and provide foundational support for fully domestic DUV lithography systems targeting 28nm and mature process nodes.
Technically, deep ultraviolet (DUV) lithography light sources rely on ArF or KrF excimer laser technology to generate 193-nanometer or 248-nanometer wavelengths for precise circuit patterning on silicon wafers. These highly complex systems integrate advanced optics, high-voltage power supplies, precision mechanics, and specialized gas management, demanding exceptional operational stability and reliability. Due to their intensive use in semiconductor fabrication, over 70% of the internal components require replacement or professional maintenance every six to twelve months; without this rigorous upkeep, entire lithography machines cannot sustain normal operation.
This consumable nature creates a highly lucrative and resilient commercial landscape. China currently operates approximately 1,500 existing DUV lithography machines, generating an estimated ¥10–20 billion annually just in the spare parts and maintenance replacement cycle. When combined with steady domestic machine installations, the incremental market adds another ¥3–5 billion per year. To capture this demand, the joint venture will build four integrated R&D and manufacturing centers covering precision machining, optical integration, electronic control systems, and special ceramics, starting with precision machining in its first phase. This dual-market approach (existing equipment upkeep plus new installations) offers strong anti-cyclical viability and high margins, positioning the venture to play a pivotal role in China’s semiconductor self-reliance push while driving commercial scalability for Anfu Technology’s optoelectronics expansion.
I didn't find too much information about this company so take this with a grain of salt. Looks like that there is another DUV Lithography light source company in the supply chain, for now the most well known company is Beijing RSLaser Opto-Electronics, the company has accumulated enough pedigree to be one the few companies in the world to build this kind of lithography light source subsystems, the 3rd company in the world to be exact. You know you are dealing with a decent company when you can get research papers and university collaborations.


The issue is that no one knows if China lithography current supply chain would be like ASML, exclusive to one frontend lithography company or would be a open ecosystem. You have the first companies of the project 02 like Gouwang Optical from CIOMP, RSLaser, U-Precision and others.
Outside that group some entrants maybe MLOptic, this company for light sources, many of the nanopositioning companies and others that can jump to make wafer stages. That open the doors to some I-line lithography steppers companies that I posted here. It also helps China in maintaining their current fleet of ASML machines if the Match ACT is passed and signed.






