Chinese semiconductor thread II

tokenanalyst

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Peking University Team Achieves All-Carbon Nanotube CFET Digital Logic Circuit.​

Researchers from Peking University, led by Professor Liang Xuelei, have achieved a major breakthrough in semiconductor technology by developing the world’s first digital logic circuit based on all-carbon nanotube complementary field-effect transistors (CFETs). As traditional silicon-based transistors near their physical scaling limits, the global industry has turned to CFET architecture a design that vertically stacks N-type and P-type devices to achieve higher transistor density for future sub-2-nanometer process nodes. Carbon nanotubes are especially well-suited for this approach due to their ultra-high carrier mobility, near-ballistic charge transport, and low-temperature processing compatibility, which is crucial for three-dimensional chip integration. This work fills a critical international research gap by demonstrating that carbon nanotube CFETs can transition from isolated components into fully functional digital systems, offering a viable pathway for post-silicon computing architectures.
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The development faced two primary technical hurdles: balancing the inherently mismatched driving capabilities of P-type and N-type carbon nanotube transistors, and preventing high-temperature fabrication steps from degrading the performance of underlying device layers. To resolve these issues, the research team introduced a novel doping-free CMOS design strategy that optimizes transistor geometry to ensure matched electrical characteristics while thermally insulating lower layers during upper-layer processing. This innovative structural approach enabled the successful fabrication of highly stable all-carbon nanotube CFET inverters that operate reliably across a broad voltage range of 0.2 V to 1 V with low power consumption. At just 1 V, the devices achieved a peak voltage gain of 164, setting a new record for low-dimensional semiconductor CFETs and confirming their suitability for complex digital logic operations.

Building on these high-performance components, the team successfully integrated them into complete digital circuits, including basic AND, OR, NAND, and NOR gates, as well as a four-transistor static random-access memory (SRAM) cell. Most notably, they constructed the world’s first five-stage ring oscillator using this all-carbon nanotube CFET architecture, marking a decisive step from single-device validation to system-level implementation.
This milestone not only demonstrates the practical viability of carbon nanotube-based vertical stacking but also establishes a foundational blueprint for next-generation high-density, low-power integrated circuits that could ultimately overcome the limitations of traditional silicon technology.

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tokenanalyst

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TCL CSOT's 27-inch printed OLED is about to enter mass production.​


TCL is accelerating its production process for medium and large-sized OLED displays. The high-end IT display market, including monitors, laptops, and tablets, is expected to undergo an inevitable shift in its landscape.

According to reports, TCL CSOT, a display subsidiary of TCL, has successfully completed internal verification and entered mass production of a 27-inch 4K 120Hz RGB striped OLED display panel developed using inkjet printing technology. This marks TCL's first independent production of medium-to-large-size OLED panels, excluding special-purpose displays such as those for medical applications.

TCL CSOT announced an investment plan of approximately RMB 1.5 billion, aiming to triple the production capacity of its Wuhan factory. The factory is expected to serve as a transitional and outpost base until the completion of its 8.6-generation OLED T8 inkjet printing production line under construction in Guangzhou.

This means that TCL will begin producing OLED panels ahead of schedule, before its 8.6-generation OLED factory, which is expected to achieve mass production in 2027. The market landscape in this field is expected to change rapidly.

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sunnymaxi

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Peking University Team Achieves All-Carbon Nanotube CFET Digital Logic Circuit.​

Researchers from Peking University, led by Professor Liang Xuelei, have achieved a major breakthrough in semiconductor technology by developing the world’s first digital logic circuit based on all-carbon nanotube complementary field-effect transistors (CFETs). As traditional silicon-based transistors near their physical scaling limits, the global industry has turned to CFET architecture a design that vertically stacks N-type and P-type devices to achieve higher transistor density for future sub-2-nanometer process nodes. Carbon nanotubes are especially well-suited for this approach due to their ultra-high carrier mobility, near-ballistic charge transport, and low-temperature processing compatibility, which is crucial for three-dimensional chip integration. This work fills a critical international research gap by demonstrating that carbon nanotube CFETs can transition from isolated components into fully functional digital systems, offering a viable pathway for post-silicon computing architectures.
View attachment 178111
The development faced two primary technical hurdles: balancing the inherently mismatched driving capabilities of P-type and N-type carbon nanotube transistors, and preventing high-temperature fabrication steps from degrading the performance of underlying device layers. To resolve these issues, the research team introduced a novel doping-free CMOS design strategy that optimizes transistor geometry to ensure matched electrical characteristics while thermally insulating lower layers during upper-layer processing. This innovative structural approach enabled the successful fabrication of highly stable all-carbon nanotube CFET inverters that operate reliably across a broad voltage range of 0.2 V to 1 V with low power consumption. At just 1 V, the devices achieved a peak voltage gain of 164, setting a new record for low-dimensional semiconductor CFETs and confirming their suitability for complex digital logic operations.

Building on these high-performance components, the team successfully integrated them into complete digital circuits, including basic AND, OR, NAND, and NOR gates, as well as a four-transistor static random-access memory (SRAM) cell. Most notably, they constructed the world’s first five-stage ring oscillator using this all-carbon nanotube CFET architecture, marking a decisive step from single-device validation to system-level implementation.
This milestone not only demonstrates the practical viability of carbon nanotube-based vertical stacking but also establishes a foundational blueprint for next-generation high-density, low-power integrated circuits that could ultimately overcome the limitations of traditional silicon technology.

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TSMC is targeting the CFET architecture for its sub-1nm logic nodes, aiming for commercial production around 2032–2033.

its good to see the progress in CFET architecture from top Chinese research institutes.
 

tokenanalyst

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Another indium phosphide (IP) photonics chip company completes financing of over 100 million yuan.​


Recently, Changzhou Zhonglou Specialized and Innovative Investment Partnership (Limited Partnership), a fund under Zhongjin Holdings Group, completed its investment in Nanjing Jingyao Xinhui Semiconductor Technology Co., Ltd.

The financing amount exceeded 100 million yuan, led by Zhongjin Holdings Group. The funds raised will be mainly used to build a wafer fabrication plant (FAB), further improve the company's independent manufacturing capabilities throughout the entire process from indium phosphide epitaxial growth and chip manufacturing to testing and verification, and accelerate the industrialization layout of high-end optical chips.

Founded in October 2023 and headquartered in Nanjing, Jingyao Xinhui is a company specializing in the R&D and manufacturing of high-end indium phosphide (InP) epitaxial materials and optical chips. The company's products cover 100G and 200G high-speed EML laser chips, as well as 100mW, 200mW, and 400mW high-power continuous wave (CW) light source chips for silicon photonics integration applications, which can be widely used in high-speed optical communication, AI data centers, silicon photonics modules, and other fields.


In recent years, with the rapid development of AI large-scale model training and computing infrastructure, the demand for high-speed optical interconnects has continued to rise. EML lasers and silicon photonics source chips have become core components of high-speed optical modules, and the localization process of high-end indium phosphide photonics chips is also accelerating. Jingyao Xinhui's core team has accumulated years of technical expertise both domestically and internationally, possessing rich experience in chip design, epitaxial growth, process development, and mass production, thus building a high technological barrier for the company.

After the construction of FAB, Crystalchip will achieve integrated independent manufacturing of key links such as epitaxy, tape-out, and testing, which will help further improve product performance consistency, yield and large-scale delivery capabilities, and better meet the growing demand for high-end optical chips in markets such as AI data centers and high-speed optical communications.

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tokenanalyst

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AMEC New generation cryogenic etching equipment has been delivered and validated.​


Yin Zhiyao further stated that the company's dielectric etching products continue to maintain rapid growth, and the next-generation 90:1 ultra-high aspect ratio low-temperature etching equipment has been delivered to clients for verification. Currently, the company has fully covered various ultra-high aspect ratio process requirements for memory etching, and its technical strength continues to benchmark against international leading levels.

While consolidating its leading position in the etching business, AMEC continues to improve its product portfolio. In terms of thin film equipment , it has successfully developed tungsten series thin film deposition equipment, ALD titanium nitride, ALD titanium aluminum, ALD tantalum nitride and other products, as well as molybdenum metal deposition equipment.

Yin Zhiyao revealed that the company's PECVD equipment, which uses a very high frequency decoupled reactive ion plasma source and is equipped with 16 reaction stages, is progressing smoothly with various verification efforts from customers. The newly developed CuBS PVD multi-reaction-cavity integrated equipment significantly reduces the resistivity of BS compared to standard equipment at home and abroad, and increases the output rate by 50% to 100%. It has been recognized by several leading customers and has been delivered to advanced logic device R&D lines in China for verification.

In the field of advanced packaging , AMEC has already delivered core etching equipment such as CCP and TSV equipment in batches, and has also deployed equipment such as PVD, CVD, ECP, bonding and measurement.

In the metrology equipment sector , AMEC has established a presence in this area through investments and the establishment of subsidiaries. Yin Zhiyao stated that its subsidiary, AMD, has brought in several top international experts in the field of electron beam metrology equipment and has planned to cover a variety of metrology equipment products.

On the production capacity side , AMEC's approximately 180,000-square-meter production and R&D base in Lingang, Shanghai, officially commenced operation in August 2024, and the second phase of the Lingang production and R&D base, covering approximately 200,000 square meters, is scheduled to begin construction in the second half of 2026.

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tokenanalyst

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IC EAST 300nm I-line stepper lithography machine. The company started refurbishing lithography scanners, making spare parts replacement and so on in 2023. Then some in the company decided they should make their own steppers, you can get the optics from MLoptics and Guowang Optical, Wafer stages from many domestic companies and interferometers. Like a said what happening in China is not just SMEE creating a lithography machine but that entire country building a supply chain for lithography machines of many kinds.

The interesting part is that they plan to make a KrF scanner starting next year. That is a big leap from an I-line stepper.


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tokenanalyst

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AMEC New generation cryogenic etching equipment has been delivered and validated.​


Yin Zhiyao further stated that the company's dielectric etching products continue to maintain rapid growth, and the next-generation 90:1 ultra-high aspect ratio low-temperature etching equipment has been delivered to clients for verification. Currently, the company has fully covered various ultra-high aspect ratio process requirements for memory etching, and its technical strength continues to benchmark against international leading levels.

While consolidating its leading position in the etching business, AMEC continues to improve its product portfolio. In terms of thin film equipment , it has successfully developed tungsten series thin film deposition equipment, ALD titanium nitride, ALD titanium aluminum, ALD tantalum nitride and other products, as well as molybdenum metal deposition equipment.

Yin Zhiyao revealed that the company's PECVD equipment, which uses a very high frequency decoupled reactive ion plasma source and is equipped with 16 reaction stages, is progressing smoothly with various verification efforts from customers. The newly developed CuBS PVD multi-reaction-cavity integrated equipment significantly reduces the resistivity of BS compared to standard equipment at home and abroad, and increases the output rate by 50% to 100%. It has been recognized by several leading customers and has been delivered to advanced logic device R&D lines in China for verification.

In the field of advanced packaging , AMEC has already delivered core etching equipment such as CCP and TSV equipment in batches, and has also deployed equipment such as PVD, CVD, ECP, bonding and measurement.

In the metrology equipment sector , AMEC has established a presence in this area through investments and the establishment of subsidiaries. Yin Zhiyao stated that its subsidiary, AMD, has brought in several top international experts in the field of electron beam metrology equipment and has planned to cover a variety of metrology equipment products.

On the production capacity side , AMEC's approximately 180,000-square-meter production and R&D base in Lingang, Shanghai, officially commenced operation in August 2024, and the second phase of the Lingang production and R&D base, covering approximately 200,000 square meters, is scheduled to begin construction in the second half of 2026.

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AN APPROACH TO IMPROVE DISTORTION WITH HIGH-ASPECT-RATIO CRYOGENIC ETCHING USING BORON-CONTAINING GASES​


ABSTRACT

Cryogenic etching is building a "high-speed railway" in high-aspect-ratio (HAR) channel hole patterning due to its enhanced etch rates and improved profile. However, shape-deformation or circularity distortion of holes appears with increased aspect ratio. Here, we report a novel process associated with boron-containing gas, such as BCL3 or BF3 provide a positive effect on maintaining hole circularity from top to bottom. By tuning addition mode and amount of B-based gas, the hole distortion can be significantly improved even if the temperature is as low as -60C. The findings can provide guidance for process optimization in very high-aspect-ratio etch to meet advanced memory devices.

CONCLUSION
To improve the distortion in HAR cryogenic dielectric etch, it is explored that strategy of using boron-containing gases to protect sidewall from ion bombardment by depositing stubborn byproducts. When using the strategy, barely distorted holes were observed. The side effects on ER and bowing could be weakened through gas pulsing mode. Specially, BCL3 could significantly improve the distortion even temperature down to -50C In addition, there is a discovery that the slower carbon ER could be achieved by the alternative gas, BF3 It is believed that the technique suggested in this study can be applied further to processing of next-generation devices requiring HAR channel hole.​


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AMEC is using domestic Chillers for their cryogenic etchers.

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tokenanalyst

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Xinlian Integrated's 12-inch automotive-grade mixed-signal chip manufacturing project commences construction.​

According to the Shaoxing Daily, the 12-inch automotive-grade mixed-signal chip manufacturing project of ChipLink Integrated recently broke ground in the Shaoxing area of the Hangzhou-Shaoxing Airport Economic Zone. As a key project of ChipLink Integrated's fourth phase, the project plans a total investment of approximately 20 billion yuan to build a new chip production line with a monthly capacity of 50,000 wafers. Through capacity expansion and technological upgrades, it aims to enter the new track of AI computing power.

The project covers approximately 500 acres and is jointly invested and constructed by ChipLink Integrated Circuits and related parties. Its core technology products cover 40/28nm MCU/DSP, 90/55nm BCD/DrMOS and other analog circuits, and 55nm silicon photonics/laser drivers and other chips. Once completed and fully operational, the project is expected to generate an annual output value exceeding 5.5 billion yuan.
The commencement of the 12-inch automotive-grade mixed-signal chip manufacturing project by Chiplink Integrated marks its formal entry into two new tracks: AI server power supplies and optical interconnects, building upon its existing strengths in the new energy vehicle and industrial control markets. Since establishing itself in Shaoxing, Chiplink Integrated has continuously deepened its strategic layout and iteratively expanded its capabilities, successfully completing the commissioning of three phases of its projects: Phase I established an 8-inch silicon-based wafer production line; Phase II established a silicon-based power device production line and expanded into silicon carbide MOSFETs, gallium arsenide VCSEL lasers, and power drivers; and Phase III implemented the 12-inch mixed-signal chip manufacturing project. Currently, Chiplink Integrated's annual wafer production capacity reaches 2.5127 million wafers (equivalent to 8 inches). After the fourth phase of the project is put into operation, its total capacity will exceed 400,000 wafers per month.

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tokenanalyst

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Qiyunfang EDA and the National Innovation Basic Resource Library complete full-chain joint verification​


China’s domestic electronic EDA industry has achieved a significant breakthrough with the successful full-chain joint verification between Qiyunfang’s electronic engineering EDA tools and the National Innovation Basic Resource Library. This collaboration has established stable, efficient, and scalable connectivity across the entire system, marking a pivotal shift toward a "tool + resource integration" ecosystem. By overcoming previous compatibility issues between domestic design tools and component resource systems, this achievement lays a solid foundation for the independent implementation of industrial software in China, moving the sector from isolated tool development to comprehensive ecosystem competition.

The verification process covered the complete workflow of real-world industrial engineering design, including schematic design, PCB layout, component selection, and package parameter matching. The results demonstrated seamless integration between Qiyunfang’s software and the national resource library, effectively eliminating data barriers and manual verification bottlenecks that have long hindered R&D efficiency. This integration allows for standardized component retrieval and uninterrupted data flow, significantly reducing cross-platform adaptation workloads and communication costs. Consequently, domestic EDA capabilities have upgraded from merely being "usable" to becoming "easy to use, stable, reliable, and batch reusable" in complex industrial scenarios.

This milestone represents a transition for China’s domestic EDA industry from an alternative solution to a mainstream engineering application capable of large-scale implementation. By combining Qiyunfang’s mature schematic and PCB design capabilities with the National Innovation Basic Resource Library’s comprehensive component reserves, the partnership has created an independently controllable closed-loop system. This proves that China possesses the fundamental capability to undertake complex electronic engineering projects using local software and hardware resources, thereby enhancing the consistency of circuit design data and accelerating product iteration cycles.

Looking ahead, Qiyunfang and the National Innovation Basic Resource Library plan to deepen their collaboration by focusing on unifying high-level data standards, expanding component reserves, and enhancing intelligent design automation. This joint effort aims to strengthen the foundation of China’s independent core industrial software, accelerate the widespread adoption of domestic EDA tools across various industries, and provide robust software support for the transformation of China’s high-end electronic manufacturing sector into a global manufacturing powerhouse.​

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