Naura Semiconductor double digits increase in R&D spending.
The company's R&D expenses for the first three quarters of 2025 were RMB 3.285 billion, an increase of 48.4% year-on-year, with an R&D expense ratio of 12.0%, an increase of 1.3 percentage points year-on-year. In the first half of 2025, the company achieved the milestone of delivering its 1,000th complete unit of vertical furnace and physical vapor deposition (PVD) equipment. Including the etching equipment that achieved this goal earlier, the company's cumulative shipments of three main equipment products have exceeded 1,000 units. At the same time, the company launched new products such as ion implantation equipment, electroplating equipment, advanced low-pressure chemical vapor deposition vertical furnaces for silicon, and metal-organic chemical vapor deposition equipment. As of Q3 2025, the company has a sufficient order backlog, which can effectively guarantee subsequent revenue growth.