This is mostly high level knowledge, it doesn't require advanced learning or degrees just because I thought of it. If you look at how LPP EUV generates the light source, zapping a plasma cloud by laser will create a diffuse EUV flash that by definition will be inefficient no matter how many mirrors you use to try focusing that light. The more mirrors you use to focus the light, the more EUV is absorbed by the optics. On top of that, LPP EUV light outputs a lot of essentially useless light on the UV spectrum. Cymer tried overcoming these disadvantages by increasing the source power but there is only so much EUV power that can be generated via LPP.This raise my interest on learning optical physics, what kind of course or major that dwelled this knowledge?
Imo, LPP EUV is far inferior to SSMB EUV for these reasons because a synchrotron driven light source, which is what SSMB essentially is, can be ramped up dramatically measured in equivalent source power of thousands of watts in the future. Not immediately, not soon, but eventually. The laser like nature of SSMB EUV light also contributes to using fewer mirrors, less diffraction of EUV light/power and is a much more controllable and narrow spectrum light source. It's not just a superior EUV light source, it can and probably will affect other aspects of a lithograph machine such as photoresist development, dual stage processes, etc.
When you think about how this all comes to together, you realize that this has the potential to drive giga sized fab plants that would dwarf what exists today. The issue is the development time. This is still ongoing research but it has already been publicly stated that such research is for creating a lithography machine sometime by this decade, but a decade is a long time.