No issues with IP. The paper was essentially a research collaboration between China and Germany. Any IP coming from this would be process related, IP which has yet to be created since that IP is coming in the next few years from the new Beijing R&D facility geared towards creating a SSMB EUV lithography light source.@krautmeister Sir thanks for your explanation, I learned a lot, from what you posted, China is in the forefront regarding research of new tech especially the power source which is lacking at the moment. Sir from what I read its a collaboration is there a problem regarding IP? the US is using legal means to disrupt Chinese tech development.