For hotel chains, it won't happen because US wont allow. usa forced the divestment of Radisson usa operations due to security concern (chinese government has the information of americans hotel stays!)
Chinese semiconductor thread II
- Thread starter vincent
- Start date
If you call Samsung 5LPE 5nm, then N+3 is also 5nm.
Funny how anyone and everyone unequivocally say that 5LPE is 5nm(see Snapdragon 888(the horrible thermal issues)) but will do everything to say that SMIC N+3 which has a higher density than 5LPE is NOT 5nm. Compared to the 888 with huge thermal issues, the 9030 pro has stellar performance equal to 8 gen 3 gpu and cpu, while having amazing thermal control, we'll see the smic n+3 is not 5nm narrative going forward tho
antiterror13
Brigadier
How many NXT:2000i and the NXT:2050i SMIC have ? is there any other company outside SMIC have those ?
Seems like they might have sacrificed on yield for a more aggressive design which if that’s the case good on them. They’re probably primed to take a big leap with even provisional introduction of EUV steps on the margins if that’s what they’ve managed with the 9030.
N+2 is at the very least 90% yield now, just see the number of products it's used in and how many they've shipped(yet bloomberg say cambricon's 590 and 690 is only 20% yield), N+3 6 months ago was 50% probably, i'd say the process as of now is 65-70% yield, should break 80% soon
I’m doubtful N+3 yield is more than 50% given Huawei’s release strategy for the 9030. I think people should keep their expectations modest. If they tried to speed run N+3 last year and fell short, and then still had to take such an aggressive binning approach to the release so late this year, that probably means they’ve been struggling to produce enough chips all year. There might be some very difficult to overcome constraints depending on DUVi to fab at 5 nm for volume production.
broadsword
Brigadier
Don't forget this breakthrough that cuts chip defects by 99%.
Chinese Researchers Make Breakthrough in Reducing Chip Manufacturing Defects
Zheng Xutong
DATE: Oct 28 2025
SOURCE: Yicai
(Yicai) Oct. 28 -- A research team led by Peng Hailin, a professor at Peking University's College of Chemistry and Molecular Engineering, has managed to reduce pattern defects in chip lithography by using cryo-electron tomography, a method normally used in structural biology.
The team used cryo-ET to reconstruct polymer in a liquid film for fab-compatible lithography, reducing the polymer residues of developed patterns on 12-inch wafers by 99 percent, according to findings published in scientific journal Nature on Sept. 30.
Lithography is a key process in semiconductor manufacturing that uses light irradiation to change the solubility of photoresist and then uses developer to dissolve the exposed photoresist to create designed circuit patterns on a silicon wafer.
The new method can be immediately applied in semiconductor manufacturing due to the technology being compatible with existing equipment, Peng told Yicai. Feedback from the industry is necessary for further improvements and for the team to find future study directions, he pointed out.
Liquid film serves as the critical medium for the dissolution of photoresist to create nanoscale circuit patterns in lithography, the team said in the study. However, the microscopic behaviors of photoresist in liquid film and at interfaces remain elusive despite decades of research, leading to industrial effort for pattern defect control being largely a trial-and-error, they noted, adding that the main bottleneck is the absence of a suitable high-resolution imaging technique.
To address this challenge, the team developed the cryo-ET method to reveal the photoresist behaviors in liquid films. Compared with conventional methods, such analysis can reconstruct the three-dimensional structures and interfacial distributions of photoresist polymers at high resolution while maintaining the native structures of polymer-based photoresist in liquid films during imaging and resolving polymer entanglements of photoresist molecules.
The global semiconductor photoresist market topped USD2.7 billion last year and will likely reach USD4.5 billion by 2031, according to QY Research. Leading companies are primarily based in Japan, the United States, and South Korea, including Tokyo Ohka Kogyo, JSR, and Shin-Etsu Chemical, while Chinese firms have broken into the sector with mid to low-end products.
Although China faces restrictions on importing advanced lithography machines, it is still necessary for domestic companies to develop high-end products such as extreme ultraviolet photoresist to catch up with international peers, Peng noted.
Chinese Researchers Make Breakthrough in Reducing Chip Manufacturing Defects
Zheng Xutong
DATE: Oct 28 2025
SOURCE: Yicai
(Yicai) Oct. 28 -- A research team led by Peng Hailin, a professor at Peking University's College of Chemistry and Molecular Engineering, has managed to reduce pattern defects in chip lithography by using cryo-electron tomography, a method normally used in structural biology.
The team used cryo-ET to reconstruct polymer in a liquid film for fab-compatible lithography, reducing the polymer residues of developed patterns on 12-inch wafers by 99 percent, according to findings published in scientific journal Nature on Sept. 30.
Lithography is a key process in semiconductor manufacturing that uses light irradiation to change the solubility of photoresist and then uses developer to dissolve the exposed photoresist to create designed circuit patterns on a silicon wafer.
The new method can be immediately applied in semiconductor manufacturing due to the technology being compatible with existing equipment, Peng told Yicai. Feedback from the industry is necessary for further improvements and for the team to find future study directions, he pointed out.
Liquid film serves as the critical medium for the dissolution of photoresist to create nanoscale circuit patterns in lithography, the team said in the study. However, the microscopic behaviors of photoresist in liquid film and at interfaces remain elusive despite decades of research, leading to industrial effort for pattern defect control being largely a trial-and-error, they noted, adding that the main bottleneck is the absence of a suitable high-resolution imaging technique.
To address this challenge, the team developed the cryo-ET method to reveal the photoresist behaviors in liquid films. Compared with conventional methods, such analysis can reconstruct the three-dimensional structures and interfacial distributions of photoresist polymers at high resolution while maintaining the native structures of polymer-based photoresist in liquid films during imaging and resolving polymer entanglements of photoresist molecules.
The global semiconductor photoresist market topped USD2.7 billion last year and will likely reach USD4.5 billion by 2031, according to QY Research. Leading companies are primarily based in Japan, the United States, and South Korea, including Tokyo Ohka Kogyo, JSR, and Shin-Etsu Chemical, while Chinese firms have broken into the sector with mid to low-end products.
Although China faces restrictions on importing advanced lithography machines, it is still necessary for domestic companies to develop high-end products such as extreme ultraviolet photoresist to catch up with international peers, Peng noted.
Techinsights did,
Qualcomm SM8350 Snapdragon 888 Samsung 5 nm LPE CPU (X1) SoC Design Analysis
This report provides a SoC Design Analysis of the Qualcomm SM8350 Snapdragon 888 application processor, built on Samsung's 5 nm LPE finFET process , But they're saying N+3 is not true 5nm
Classic fascist bullshit, rightfully sanctioned