What makes a 28 nm node a so called sub standard node?
Chinese semiconductor industry
- Thread starter Hendrik_2000
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Diversify your options, do not rely exclusively on the cloud but also produce your own chips.
I've analyzed this article before. He has no idea what he's talking about. For example he apparently doesn't count smartphone SoCs as "CPUs" even though they have the functionality of CPUs.
And by his logic, South Korea is one of the weakest countries in semiconductors ever, since they have zero GPU companies, zero CPU companies and zero FPGA companies. LMAO what a fucking preposterous idea, yet that's the conclusion of his logic. Then finally is the hilarious idea that 28 nm is 'substandard'. I guess TSMC had better stop shipping 28 nm because it's substandard and start fabbing all their 28 nm chips on 5 nm EUV just to not be 'substandard' in this joker's eyes.
Seriously, this forum needs a downvote specifically for joke comments like this.
Does this mean China had successfully develop an EUVL? After Conquering the 3 obstacle China has made breakthroughs in both EUV light sources and optical lenses, plus the dual-workpiece stage technology? So a possible appearance of a CHINESE EUVL in 2022?
Earlier, at the International Mathematics Conference, Academician Ming of Wuhan expressed his views on Chinese-made lithography machines. He believed that the world's most advanced EUV lithography machines could not be manufactured by China on its own. Why? The academician thinks so, because there are 100,000 precision parts in a lithography machine, and there are more than 5,000 suppliers among them, and they are all over the world. Now the EUV lithography machine manufactured by ASML in the Netherlands , Is also the crystallization of the wisdom of European and American countries. Therefore, Academician Wu believes that it is unrealistic for China to develop EUV lithography machines on its own.
However, the good news that has been coming recently has given us confidence, telling us that it is not impossible to make EUV lithography machines in China, and even now there is only the last step left. Today, I will show you how China conquered lithography machines. The 3 key technologies of China.
Recently, there have been two good news in the field of lithography machines. According to CCTV News, the Institute of High Energy Physics of the Chinese Academy of Sciences has created China's first high-energy synchrotron radiation light source equipment, and it started on June 28. Installation, in addition, the test platform that provides technical support for this light source equipment has also begun trial operation.
At the same time, CCTV News also reported that Zhongke Kemei has developed a linear Lloyd lens coating device and a nano-focusing mirror coating device. This device has also been officially put into use on June 28.
The names of these two technologies sound tall, so what are they used for? First, we have to understand the specific structure of the lithography machine. The lithography machine has a total of three core components, which are dual workpiece tables, and the second is EUV. The light source, the third is EUV optical lens, as the name suggests, high-energy synchronous light source equipment, is the equipment used in EUV light source.
The light source is the core of the lithography machine. The main technology of the chip manufacturing process is the light source. Today, the high-energy synchronous light source developed by the Chinese Academy of Sciences is currently the brightest light source in the world. The fourth-generation synchrotron radiation light source can reduce the high-end The difficulty of the chip for the process of lithography equipment meets most of the aerospace and semiconductor sweat requirements for the light source process, which means that China's EUV lithography machine has overcome one of the most core technologies, and China's EUV lithography machine finally Have a foundation.
The equipment of the Chinese Academy of Sciences has broken through the technology of the light source, and the two major coating equipment launched by the Science and Technology Co., Ltd. are related to the optical lens in the lithography machine. In the EUV lithography machine, a light lens is required, except for the lens material. In addition, the core technology is actually the optical coating. Optical coating can be understood as a layer of film on the lens. We usually see it on camera lenses, glasses, astronomical telescopes and other equipment, although it is only a thin layer or Several layers of film, but a good coating process can control the reflection, filtering, polarization and other requirements of optical parts on light.
Previously, China was not technologically advanced in this area. Japanese companies such as Nikon, Sony, Germany's Leica, and Zeiss have far surpassed China's technology in this area. It can even be said that there is no decent optical company in China at all. The reason why many high-end instruments and equipment are monopolized by foreign countries.
The lens of the lithography machine also has very high requirements for optical coating. The lens finish of the EUV lithography machine must not exceed 0.05 nanometers. Currently, only Zeiss in Germany can produce lenses that meet the requirements, and there are only 20 related engineers. First, the level of the coating equipment launched by the Science and Technology Co., Ltd. is already the most difficult vacuum coating process at present. Although it has not reached the level of Zeiss, it can also control the accuracy of the film thickness within 0.1 nanometers, and more importantly Yes, all the technology of this equipment is completely in the hands of China. The emergence of this coating equipment can make China more advanced in the development of EUV lithography machines. Today, the installation of high-energy synchrotron radiation light source equipment has been completed by 70%. The installation will be completed smoothly in 2022.
In terms of light source, in addition to equipment, there is also an extreme ultraviolet light source technology that is equally important. It is the most direct lithography equipment for wafers in lithography. The Chinese Academy of Sciences has also made breakthroughs in this regard, and proposed a new type of particle accelerator. , Can cover the light source needed by EUV lithography machine.
China has made breakthroughs in both EUV light sources and optical lenses. But in terms of the technology of the dual-workpiece stage, in fact, the dual-workpiece stage technology has made breakthroughs a long ago. The main function of the dual-workpiece stage is to carry The wafers follow the predetermined route and complete the required actions of lithography through a predetermined movement. Previously, only the Dutch ASML company had mastered the technology. However, in 2020, the Chinese private enterprise Beijing Huazhuo Jingke will use 4 years of Time completed the breakthrough of this technology and broke the monopoly of the Dutch company ASML.
Therefore, in China today, breakthroughs have been made in the three core EUV technologies. This means that it may really be possible for China to complete the independent research and development of EUV lithography machines. Moreover, China has a huge market The production of 100,000 parts for the engraving machine may not be a problem.
It seems that China is very close to high-end lithography machines, but I have to pour cold water here. In fact, China's technology accumulation on EUV lithography machines is still far from good. Although China has broken through the coating technology, it is far from the lens. There is still some time to make it. In fact, many subsequent parts are like this. Even if it is a key technological breakthrough, other things still need to be tried and overcome.
From the development of technology to the appearance of actual products, it takes a long time. China has already walked more than half of this road, and only the final step is left. However, it takes a lot of time in China. In the short term, China will still It is difficult to complete. However, the EUV lithography machine independently developed by China is at least hopeless. As long as there is a chance, China will never give up.
China's inability to make breakthroughs in high-end lithography machines means that China's high-end chips still have to be controlled by others. Fortunately, China is not in a hurry. Under the background of the global chip shortage market, it has created opportunities for China's chip industry and also given China. For more time, it is impossible to have high-end chips in the short term. In fact, the impact on China is not too great, because according to the current level of technology, most high-tech equipment does not need to use too high-end chips, 3 nanometers Such chips are not widely used. In the next few years, they will only be used on mobile phones, and it will take longer to make breakthroughs in chips.
Therefore, it has been a long time for China to develop EUV lithography machines. Perhaps by that time, the United States may not be able to continue sanctions against China. Of course, we cannot pin our hopes on the United States. Only our own breakthroughs can completely lift the restrictions of the United States.
In addition, China's chip breakthroughs may not necessarily require die-hard silicon chips. At last year's Graphene Conference, China demonstrated 8-inch graphene wafers, which means that there is a new member in the chip field. In this regard, China has already led the world, and perhaps China will achieve a corner overtaking of the chip on the graphene chip.
New breakthroughs in China's EUV lithography machine, how far is it from success?
2021-10-30 20:53 HKTEarlier, at the International Mathematics Conference, Academician Ming of Wuhan expressed his views on Chinese-made lithography machines. He believed that the world's most advanced EUV lithography machines could not be manufactured by China on its own. Why? The academician thinks so, because there are 100,000 precision parts in a lithography machine, and there are more than 5,000 suppliers among them, and they are all over the world. Now the EUV lithography machine manufactured by ASML in the Netherlands , Is also the crystallization of the wisdom of European and American countries. Therefore, Academician Wu believes that it is unrealistic for China to develop EUV lithography machines on its own.
However, the good news that has been coming recently has given us confidence, telling us that it is not impossible to make EUV lithography machines in China, and even now there is only the last step left. Today, I will show you how China conquered lithography machines. The 3 key technologies of China.
Recently, there have been two good news in the field of lithography machines. According to CCTV News, the Institute of High Energy Physics of the Chinese Academy of Sciences has created China's first high-energy synchrotron radiation light source equipment, and it started on June 28. Installation, in addition, the test platform that provides technical support for this light source equipment has also begun trial operation.
At the same time, CCTV News also reported that Zhongke Kemei has developed a linear Lloyd lens coating device and a nano-focusing mirror coating device. This device has also been officially put into use on June 28.
The names of these two technologies sound tall, so what are they used for? First, we have to understand the specific structure of the lithography machine. The lithography machine has a total of three core components, which are dual workpiece tables, and the second is EUV. The light source, the third is EUV optical lens, as the name suggests, high-energy synchronous light source equipment, is the equipment used in EUV light source.
The light source is the core of the lithography machine. The main technology of the chip manufacturing process is the light source. Today, the high-energy synchronous light source developed by the Chinese Academy of Sciences is currently the brightest light source in the world. The fourth-generation synchrotron radiation light source can reduce the high-end The difficulty of the chip for the process of lithography equipment meets most of the aerospace and semiconductor sweat requirements for the light source process, which means that China's EUV lithography machine has overcome one of the most core technologies, and China's EUV lithography machine finally Have a foundation.
The equipment of the Chinese Academy of Sciences has broken through the technology of the light source, and the two major coating equipment launched by the Science and Technology Co., Ltd. are related to the optical lens in the lithography machine. In the EUV lithography machine, a light lens is required, except for the lens material. In addition, the core technology is actually the optical coating. Optical coating can be understood as a layer of film on the lens. We usually see it on camera lenses, glasses, astronomical telescopes and other equipment, although it is only a thin layer or Several layers of film, but a good coating process can control the reflection, filtering, polarization and other requirements of optical parts on light.
Previously, China was not technologically advanced in this area. Japanese companies such as Nikon, Sony, Germany's Leica, and Zeiss have far surpassed China's technology in this area. It can even be said that there is no decent optical company in China at all. The reason why many high-end instruments and equipment are monopolized by foreign countries.
The lens of the lithography machine also has very high requirements for optical coating. The lens finish of the EUV lithography machine must not exceed 0.05 nanometers. Currently, only Zeiss in Germany can produce lenses that meet the requirements, and there are only 20 related engineers. First, the level of the coating equipment launched by the Science and Technology Co., Ltd. is already the most difficult vacuum coating process at present. Although it has not reached the level of Zeiss, it can also control the accuracy of the film thickness within 0.1 nanometers, and more importantly Yes, all the technology of this equipment is completely in the hands of China. The emergence of this coating equipment can make China more advanced in the development of EUV lithography machines. Today, the installation of high-energy synchrotron radiation light source equipment has been completed by 70%. The installation will be completed smoothly in 2022.
In terms of light source, in addition to equipment, there is also an extreme ultraviolet light source technology that is equally important. It is the most direct lithography equipment for wafers in lithography. The Chinese Academy of Sciences has also made breakthroughs in this regard, and proposed a new type of particle accelerator. , Can cover the light source needed by EUV lithography machine.
China has made breakthroughs in both EUV light sources and optical lenses. But in terms of the technology of the dual-workpiece stage, in fact, the dual-workpiece stage technology has made breakthroughs a long ago. The main function of the dual-workpiece stage is to carry The wafers follow the predetermined route and complete the required actions of lithography through a predetermined movement. Previously, only the Dutch ASML company had mastered the technology. However, in 2020, the Chinese private enterprise Beijing Huazhuo Jingke will use 4 years of Time completed the breakthrough of this technology and broke the monopoly of the Dutch company ASML.
Therefore, in China today, breakthroughs have been made in the three core EUV technologies. This means that it may really be possible for China to complete the independent research and development of EUV lithography machines. Moreover, China has a huge market The production of 100,000 parts for the engraving machine may not be a problem.
It seems that China is very close to high-end lithography machines, but I have to pour cold water here. In fact, China's technology accumulation on EUV lithography machines is still far from good. Although China has broken through the coating technology, it is far from the lens. There is still some time to make it. In fact, many subsequent parts are like this. Even if it is a key technological breakthrough, other things still need to be tried and overcome.
From the development of technology to the appearance of actual products, it takes a long time. China has already walked more than half of this road, and only the final step is left. However, it takes a lot of time in China. In the short term, China will still It is difficult to complete. However, the EUV lithography machine independently developed by China is at least hopeless. As long as there is a chance, China will never give up.
China's inability to make breakthroughs in high-end lithography machines means that China's high-end chips still have to be controlled by others. Fortunately, China is not in a hurry. Under the background of the global chip shortage market, it has created opportunities for China's chip industry and also given China. For more time, it is impossible to have high-end chips in the short term. In fact, the impact on China is not too great, because according to the current level of technology, most high-tech equipment does not need to use too high-end chips, 3 nanometers Such chips are not widely used. In the next few years, they will only be used on mobile phones, and it will take longer to make breakthroughs in chips.
Therefore, it has been a long time for China to develop EUV lithography machines. Perhaps by that time, the United States may not be able to continue sanctions against China. Of course, we cannot pin our hopes on the United States. Only our own breakthroughs can completely lift the restrictions of the United States.
In addition, China's chip breakthroughs may not necessarily require die-hard silicon chips. At last year's Graphene Conference, China demonstrated 8-inch graphene wafers, which means that there is a new member in the chip field. In this regard, China has already led the world, and perhaps China will achieve a corner overtaking of the chip on the graphene chip.
More confirmation about The light source plus the SSMB research from Tsinghua University's a possible light sources for the EUVL.
Manufacturing is the foundation, and chip manufacturing is the top priority in the global semiconductor industry. With TSMC mastering advanced chip manufacturing technology, Samsung is firmly in the leading position, but almost all of the chip equipment produced by the two comes from the Dutch ASML company. Especially for EUV lithography machines, apart from ASML, no second company can provide it.
EUV lithography machine is the core equipment for manufacturing high-end chips. For chip process processes of 7nm and below, EUV lithography machines are required to ensure production and guarantee the yield of chips. However, foreign countries are not allowed to export such advanced equipment to mainland China.
Under the obstacle of the United States, even if ASML wants to do business in the EUV lithography machine market in China, it has more than enough energy, because 90% of the advanced components of EUV lithography machines are imported by ASML from abroad. These technologies are in the hands of foreign countries, including a large number of American technologies, and ASML cannot smoothly ship to specific customer markets.
Therefore, China must develop its own technology to achieve self-sufficiency. Regarding the research and development of EUV lithography machines, the Chinese Academy of Sciences has also broken through EUV technology and has made certain research progress in light source systems. The Chinese Academy of Sciences has publicly announced that it will enter the lithography machine to solve key problems in technical fields such as lithography machines.
In addition, Shanghai Microelectronics also has in-depth deployment of 28nm, and there is news from the industry that it will deliver a 28nm lithography machine by the end of 2021. If you add Tsinghua University's SSMB light source research, it can also be applied in the field of high-end EUV lithography machines.
ASML starts to move
From a variety of perspectives, China is fully researching lithography machine technology, whether it is 28nm of mature process or EUV lithography machine of high-end process, it has not given up.
As long as you persist, you will be able to usher in rewards. Once China becomes self-sufficient in lithography machines, I am afraid it will not need to rely on foreign imports. But in the face of such a large semiconductor market in China, will ASML be willing to lose it? The answer is no.
ASML has been participating in the development of the Chinese market and has established cooperative relationships with many mainland chip manufacturers. Except for the EUV lithography machine, the rest of the equipment can be shipped smoothly to mainland China. Since EUV lithography machines cannot be sold to mainland China, increase shipments of mature technology or mid-end lithography machines.
Among them, ASML urgently reduced the price of the 28nm process lithography machine. The purpose of this is probably to occupy the domestic chip supply chain production line before the domestic lithography machine is mass-produced. On the one hand, ASML lithography machines have better quality assurance, and there will inevitably be a large number of corporate purchases after the price is reduced.
On the other hand, domestic lithography machines can be the first to enter the production line. Will domestic companies choose cheap and stable ASML lithography machines, or will they purchase domestic lithography machines that have just been mass-produced and whose yield is not clear? The answer is clear.
The best moment for China Chip
ASML is playing a big game, trying to seize the Chinese market share with cheaper lithography machines. But ASML may be disappointed. Chinese lithography machines and Chinese chips will be replaced sooner or later, and a comprehensive breakthrough in independent technology will be achieved. A series of good news keep coming. The industry believes that domestic 28nm and 14nm chips will be mass-produced by the end of this year and next year.
The domestic 28nm lithography machine will finally usher in the day of delivery. It can be seen that China Core will usher in a century of change. Under external pressure, China Core has accelerated its growth rate instead.
This may be the best moment for China Chip. Never in history has it made significant progress in many semiconductor fields such as chip talents, equipment, manufacturing processes, and materials at the same time.
ASML said that if the lithography machine is not sold to China, China will break through this technology within three years. This may also be the reason why ASML has to urgently reduce the price of lithography machines, and no longer sell lithography machines to China. With China's breakthroughs in a series of technologies, replacing ASML and achieving self-sufficiency is not unattainable.
to sum up
The lithography machine is known as the crown in the history of human industry. It may not be realistic to achieve the mass production level of ASML's EUV lithography machine in the short term. However, China's lithography opportunities continue to accumulate. The entry of the Chinese Academy of Sciences, the research of Tsinghua University and the complete equipment of Shanghai Microelectronics are all strong back-ups for domestic lithography machines.
China Chip is undergoing a century of change, and the lithography machine will also usher in a huge breakthrough. We look forward to making more progress with the efforts of domestic researchers.
The Chinese Academy of Sciences breaks through EUV technology, and the price of ASML lithography machine is urgently reduced. Will China Core welcome a century of change?
2021-10-30 21:32 HKTBreakthrough in EUV progress
Manufacturing is the foundation, and chip manufacturing is the top priority in the global semiconductor industry. With TSMC mastering advanced chip manufacturing technology, Samsung is firmly in the leading position, but almost all of the chip equipment produced by the two comes from the Dutch ASML company. Especially for EUV lithography machines, apart from ASML, no second company can provide it.
EUV lithography machine is the core equipment for manufacturing high-end chips. For chip process processes of 7nm and below, EUV lithography machines are required to ensure production and guarantee the yield of chips. However, foreign countries are not allowed to export such advanced equipment to mainland China.
Under the obstacle of the United States, even if ASML wants to do business in the EUV lithography machine market in China, it has more than enough energy, because 90% of the advanced components of EUV lithography machines are imported by ASML from abroad. These technologies are in the hands of foreign countries, including a large number of American technologies, and ASML cannot smoothly ship to specific customer markets.
Therefore, China must develop its own technology to achieve self-sufficiency. Regarding the research and development of EUV lithography machines, the Chinese Academy of Sciences has also broken through EUV technology and has made certain research progress in light source systems. The Chinese Academy of Sciences has publicly announced that it will enter the lithography machine to solve key problems in technical fields such as lithography machines.
In addition, Shanghai Microelectronics also has in-depth deployment of 28nm, and there is news from the industry that it will deliver a 28nm lithography machine by the end of 2021. If you add Tsinghua University's SSMB light source research, it can also be applied in the field of high-end EUV lithography machines.
ASML starts to move
From a variety of perspectives, China is fully researching lithography machine technology, whether it is 28nm of mature process or EUV lithography machine of high-end process, it has not given up.
As long as you persist, you will be able to usher in rewards. Once China becomes self-sufficient in lithography machines, I am afraid it will not need to rely on foreign imports. But in the face of such a large semiconductor market in China, will ASML be willing to lose it? The answer is no.
ASML has been participating in the development of the Chinese market and has established cooperative relationships with many mainland chip manufacturers. Except for the EUV lithography machine, the rest of the equipment can be shipped smoothly to mainland China. Since EUV lithography machines cannot be sold to mainland China, increase shipments of mature technology or mid-end lithography machines.
Among them, ASML urgently reduced the price of the 28nm process lithography machine. The purpose of this is probably to occupy the domestic chip supply chain production line before the domestic lithography machine is mass-produced. On the one hand, ASML lithography machines have better quality assurance, and there will inevitably be a large number of corporate purchases after the price is reduced.
On the other hand, domestic lithography machines can be the first to enter the production line. Will domestic companies choose cheap and stable ASML lithography machines, or will they purchase domestic lithography machines that have just been mass-produced and whose yield is not clear? The answer is clear.
The best moment for China Chip
ASML is playing a big game, trying to seize the Chinese market share with cheaper lithography machines. But ASML may be disappointed. Chinese lithography machines and Chinese chips will be replaced sooner or later, and a comprehensive breakthrough in independent technology will be achieved. A series of good news keep coming. The industry believes that domestic 28nm and 14nm chips will be mass-produced by the end of this year and next year.
The domestic 28nm lithography machine will finally usher in the day of delivery. It can be seen that China Core will usher in a century of change. Under external pressure, China Core has accelerated its growth rate instead.
This may be the best moment for China Chip. Never in history has it made significant progress in many semiconductor fields such as chip talents, equipment, manufacturing processes, and materials at the same time.
ASML said that if the lithography machine is not sold to China, China will break through this technology within three years. This may also be the reason why ASML has to urgently reduce the price of lithography machines, and no longer sell lithography machines to China. With China's breakthroughs in a series of technologies, replacing ASML and achieving self-sufficiency is not unattainable.
to sum up
The lithography machine is known as the crown in the history of human industry. It may not be realistic to achieve the mass production level of ASML's EUV lithography machine in the short term. However, China's lithography opportunities continue to accumulate. The entry of the Chinese Academy of Sciences, the research of Tsinghua University and the complete equipment of Shanghai Microelectronics are all strong back-ups for domestic lithography machines.
China Chip is undergoing a century of change, and the lithography machine will also usher in a huge breakthrough. We look forward to making more progress with the efforts of domestic researchers.
More detail on SSMB the successful deployment of the domestic DUVL machine and great progress on the EUVL program as well.
China is already accelerating the progress of domestically produced chips. The United States has invited TSMC to build factories in the United States, and Samsung has followed closely behind. At the same time, the United States took out 52 billion US dollars in subsidies, and 64 corporate giants jointly established the American Semiconductor Alliance. There are also European Union, South Korea, Japan and other regions, all in the layout of the chip manufacturing industry, how can China lag behind.
Take SMIC as an example. It is building 28nm chip factories in Beijing and Shanghai, which will greatly help increase the production capacity of domestic chips. On the other hand, domestic chip materials, technology, talents and other aspects have a corresponding layout.
All this is to achieve self-sufficiency in domestic chips. But if you want to achieve self-sufficiency, there is still a very important key, and that is the lithography machine.
Without a lithography machine, chips cannot be produced. Most of the domestic lithography machines are imported, but after the United States has made frequent attempts to China's semiconductor industry, there are good news about domestic lithography machines.
For example, the Chinese Academy of Sciences announced its participation in the technological breakthrough of lithography machines. Tsinghua University has made significant progress in the SSMB light source, which is expected to be used as an EUV light source. In addition, Shanghai Microelectronics is developing an ArF immersion lithography machine, which can cover 45-22nm.
Earlier, Shanghai Microelectronics reported that it would deliver a 28nm lithography machine. I believe that the progress of this lithography machine is relatively smooth.
Can ASML still stand it?
Domestic lithography machines are accelerating, and good news comes one after another. I believe that as long as there is enough time, the progress and breakthroughs made in the future will be even greater. Look at ASML at this time, don't you know if you can stand it?
ASML very much hopes to have a deeper layout in the Chinese market, but the export control rules of the United States prevent ASML from shipping EUV lithography machines to customers in mainland China. Only deals with DUV lithography machines.
Without the support of EUV lithography machines, it is difficult for Chinese chips to conquer 5nm. But for now, China is mainly focusing on increasing production capacity, supplemented by conquering high-end technology. The process is inseparable from the lithography equipment of mature technology process. With China's manufacturing capacity, this equipment is still expected to break through and become self-sufficient.
And it happens to be a lithography machine in a mature field, and there is more market demand. ASML's annual EUV lithography machine shipments and customers are very limited. It is necessary to obtain more opportunities for the development of mature process lithography machines through the Chinese market.
With the success of domestic lithography machines, can ASML still stand it? It is estimated that ASML is also very helpless, high-end products cannot be shipped, and China is accelerating its layout in the field of mature technology.
It is estimated that ASML will be uncomfortable, so it has issued warnings one after another, saying that export controls will harm the U.S. economy. And he may lose Chinese market share in the future.
Localization is imperative
With the development speed of China's lithography machine, it is believed that there is no big problem in achieving mature process self-sufficiency. Mature processes include 28nm to 55nm, which seem to be low-end chip manufacturing processes, but 90% of equipment chips in life use mature processes.
And with the development of the Internet of Things, smart home and artificial intelligence, the demand for mature technology chip manufacturing will continue to grow. Only a few mobile phones, computers, tablets and other electronic consumer products will use high-end 7nm and 5nm.
Therefore, in building mature process chip technology and lithography equipment, China will continue to take action and increase R&D investment. It is imperative to obtain localization.
Does that mean to give up high-end chips and lithography machine technology research and development? Not really. Before fully investing in high-end chips and lithography machine research and development, it is necessary to make a step-by-step process, first complete mature process chips and lithography machines before conquering high-end technology.
Otherwise, if you step directly into high-end R&D, it is likely to fail due to unstable foundations. Such problems should be avoided, and the path that suits you is the best. Regardless of foreign research and development of 5nm, 3nm, we have to invest in it. It's not too late to wait for the corresponding strength to come back to the layout.
to sum up
China has laid out in the field of lithography machines. Although there is still room for improvement from international standards, China will not stop its self-developed lithography machines. The United States' restrictions on domestically produced chips and semiconductors have made us realize that we must master core technologies at critical moments so that we will not be controlled by others.
the successful deployment of the domestic DUVL machine and great progress on the EUVL program as well.Regarding the domestic lithography machine, good news comes one after another, can ASML still stand it?
2021-10-30 21:34 HKTGood news from domestic lithography machines one after another
China is already accelerating the progress of domestically produced chips. The United States has invited TSMC to build factories in the United States, and Samsung has followed closely behind. At the same time, the United States took out 52 billion US dollars in subsidies, and 64 corporate giants jointly established the American Semiconductor Alliance. There are also European Union, South Korea, Japan and other regions, all in the layout of the chip manufacturing industry, how can China lag behind.
Take SMIC as an example. It is building 28nm chip factories in Beijing and Shanghai, which will greatly help increase the production capacity of domestic chips. On the other hand, domestic chip materials, technology, talents and other aspects have a corresponding layout.
All this is to achieve self-sufficiency in domestic chips. But if you want to achieve self-sufficiency, there is still a very important key, and that is the lithography machine.
Without a lithography machine, chips cannot be produced. Most of the domestic lithography machines are imported, but after the United States has made frequent attempts to China's semiconductor industry, there are good news about domestic lithography machines.
For example, the Chinese Academy of Sciences announced its participation in the technological breakthrough of lithography machines. Tsinghua University has made significant progress in the SSMB light source, which is expected to be used as an EUV light source. In addition, Shanghai Microelectronics is developing an ArF immersion lithography machine, which can cover 45-22nm.
Earlier, Shanghai Microelectronics reported that it would deliver a 28nm lithography machine. I believe that the progress of this lithography machine is relatively smooth.
Can ASML still stand it?
Domestic lithography machines are accelerating, and good news comes one after another. I believe that as long as there is enough time, the progress and breakthroughs made in the future will be even greater. Look at ASML at this time, don't you know if you can stand it?
ASML very much hopes to have a deeper layout in the Chinese market, but the export control rules of the United States prevent ASML from shipping EUV lithography machines to customers in mainland China. Only deals with DUV lithography machines.
Without the support of EUV lithography machines, it is difficult for Chinese chips to conquer 5nm. But for now, China is mainly focusing on increasing production capacity, supplemented by conquering high-end technology. The process is inseparable from the lithography equipment of mature technology process. With China's manufacturing capacity, this equipment is still expected to break through and become self-sufficient.
And it happens to be a lithography machine in a mature field, and there is more market demand. ASML's annual EUV lithography machine shipments and customers are very limited. It is necessary to obtain more opportunities for the development of mature process lithography machines through the Chinese market.
With the success of domestic lithography machines, can ASML still stand it? It is estimated that ASML is also very helpless, high-end products cannot be shipped, and China is accelerating its layout in the field of mature technology.
It is estimated that ASML will be uncomfortable, so it has issued warnings one after another, saying that export controls will harm the U.S. economy. And he may lose Chinese market share in the future.
Localization is imperative
With the development speed of China's lithography machine, it is believed that there is no big problem in achieving mature process self-sufficiency. Mature processes include 28nm to 55nm, which seem to be low-end chip manufacturing processes, but 90% of equipment chips in life use mature processes.
And with the development of the Internet of Things, smart home and artificial intelligence, the demand for mature technology chip manufacturing will continue to grow. Only a few mobile phones, computers, tablets and other electronic consumer products will use high-end 7nm and 5nm.
Therefore, in building mature process chip technology and lithography equipment, China will continue to take action and increase R&D investment. It is imperative to obtain localization.
Does that mean to give up high-end chips and lithography machine technology research and development? Not really. Before fully investing in high-end chips and lithography machine research and development, it is necessary to make a step-by-step process, first complete mature process chips and lithography machines before conquering high-end technology.
Otherwise, if you step directly into high-end R&D, it is likely to fail due to unstable foundations. Such problems should be avoided, and the path that suits you is the best. Regardless of foreign research and development of 5nm, 3nm, we have to invest in it. It's not too late to wait for the corresponding strength to come back to the layout.
to sum up
China has laid out in the field of lithography machines. Although there is still room for improvement from international standards, China will not stop its self-developed lithography machines. The United States' restrictions on domestically produced chips and semiconductors have made us realize that we must master core technologies at critical moments so that we will not be controlled by others.
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