Chinese semiconductor industry


caudaceus

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The CAS recently confirmed next gen SSMB EUV light source was adequate for industrialization. SSMB EUV light source is a higher power source of EUV than LPP, think many hundreds of watts. Problem is, it's only now being industrialized so it can still be 5+ years away.
Woah they're moving fast with SSMB. Experimental papers with SSMB I think only appeared early this year.
 

krautmeister

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Yeah, the question is what is the NA and overlay precision of the SSA800. I thought it was 1.3NA with dual

Woah they're moving fast with SSMB. Experimental papers with SSMB I think only appeared early this year.
They've been working on SSMB EUV for at least 4-5 years in the lab but the results of the study were only publicized recently. The conclusion was that SSMB EUV as an industrial scale light source for mass production lithography was a go. Latest status is that an industrial research lab is being constructed in Beijing for R&D into its industrialization for lithography.

Fyi, SSMB EUV doesn't just have higher power EUV than LPP EUV, it also has a narrower frequency band, produces continuous wave radiation needing fewer mirrors and is easily scalable vs LPP EUV.
 

SleepyStudent

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They've been working on SSMB EUV for at least 4-5 years in the lab but the results of the study were only publicized recently. The conclusion was that SSMB EUV as an industrial scale light source for mass production lithography was a go. Latest status is that an industrial research lab is being constructed in Beijing for R&D into its industrialization for lithography.

Fyi, SSMB EUV doesn't just have higher power EUV than LPP EUV, it also has a narrower frequency band, produces continuous wave radiation needing fewer mirrors and is easily scalable vs LPP EUV.
If it has a narrower frequency band, that should mean its more reliable even with less mechanical controls? What's the standard deviation of the 13.5nm LPP light source compared to the current light source?
 

ansy1968

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They've been working on SSMB EUV for at least 4-5 years in the lab but the results of the study were only publicized recently. The conclusion was that SSMB EUV as an industrial scale light source for mass production lithography was a go. Latest status is that an industrial research lab is being constructed in Beijing for R&D into its industrialization for lithography.

Fyi, SSMB EUV doesn't just have higher power EUV than LPP EUV, it also has a narrower frequency band, produces continuous wave radiation needing fewer mirrors and is easily scalable vs LPP EUV.
@krautmeister Sir is this the article you been saying?

Accelerator physics: Experiment reveals new options for synchrotron light sources​

Date:February 24, 2021Source:Helmholtz-Zentrum Berlin für Materialien und EnergieSummary:Accelerator experts have used a laser to manipulate electron bunches at PTB's Metrology Light Source so that they emitted intense light pulses having a laser-like character. Using this method, specialized synchrotron radiation sources would potentially be able to fill a gap in the arsenal of available light sources and offer a prototype for industrial application


"The highlight future SSMB sources is that they generate laser-like radiation also beyond the visible spectrum of "light," in the EUV range, for example," comments Prof. Mathias Richter, head of department at PTB. And Ries emphasises: "In the final stage, an SSMB source could provide radiation of a new character. The pulses are intense, focused, and narrow-band. They combine the advantages of synchrotron light with the advantages of FEL pulses, so to speak." Feikes adds: "This radiation is potentially suitable for industrial applications. The first light source based on SSMB specifically for application in EUV lithography is already in the planning stage near Beijing.
 

ansy1968

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Here is a more complete report.

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/ New Options for Synchrotron Light Sources

RESEARCH NEWS​

New Options for Synchrotron Light Sources​

Patricia Daukantas
microbunching

The illustration visualizes how modulation of electron bunches via laser is used to produce microbunches that emit laser light. [Image: Tsinghua University]
Scientists using particle accelerators as brilliant photon sources have had to choose between two options: a synchrotron with a storage ring, which yields high pulse-repetition rates but less power, or a linear accelerator, which offers high brightness but lousy repetition rates. A decade ago, two scientists proposed a mechanism for producing coherent radiation with the best of both acceleration models, but it remained in the theoretical realm.
Now, however, scientists based in Germany and China have experimentally demonstrated the mechanism for creating laser-like radiation pulses with high repetition rates from a synchrotron light source (Nature, doi:
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). The proof of concept could lead to improved photon sources, with a wide range of wavelengths, for applications ranging from fundamental physics and biology to industrial-scale lithography.

Long and short bunches​

Both synchrotrons and linear accelerators produce radiation pulses by accelerating bunches of electrons to almost the speed of light. In typical synchrotrons, storage rings hold the fast-moving electron bunches without accelerating them further until the particles are released down a beamline. Linear accelerators use each bunch only once, giving a brilliant flash—but limiting the number of flashes to the rate at which the accelerator can speed up the particle clusters.
In 2010, two physicists at Stanford University, USA, theorized that shortening the length of the electron bunches in a storage ring could generate the desired combination of high power and high repetition rates. They dubbed their model “solid-state microbunching” (SSMB) because it shrinks the size of these bunches from the 1-mm-to-10-mm range down to the scale of 10 μm to a few nanometers. Xiujie Deng of Tsinghua University, China, developed the theory further, and one of the Stanford scientists, Alexander Chao, joined Deng and Tsinghua’s Chuanxiang Tang in proposing the experiment at an existing synchrotron radiation facility.

The synchrotron setup​

experimental setup

Experimental setup. The stored electron bunches are modulated by a laser in an undulator. They become microbunched after one revolution in the storage ring and produce coherent radiation. [Image: PTB/HZB]
For the experiment, the physicists turned to the Metrology Light Source (MLS), a synchrotron storage ring operated by the Physikalisch-Technische Bundesanstalt (PTB), Germany. The team stored 250-MeV electron bunches in the quasi-isochronous storage ring and modulated them with a 1064-nm laser beam. Just past the point at which the laser beam is injected into the storage ring, a planar modulator modulates the energies of the electrons, and after one trip around the ring (48 m in circumference), the electrons have clustered themselves into microbunches about 1 μm long. A dichroic mirror and other optics focused the second harmonic of the modulated beam into a photodetector to confirm the microbunching behavior.
“The huge challenge we had to face was to maintain the phase correlation between the electron energies, introduced by the laser fields, over one complete revolution in a storage ring,” says Jörg Feikes, an accelerator specialist at the Helmholtz-Zentrum Berlin (HZB), Germany. “This precise turn-by-turn phase correction is the mechanism to support the realization of steady-state microbunching.”
The MLS, in operation since 2008, was not designed for SSMB experiments, according to Feikes. However, it had one distinction crucial to the success of this project: It is the first accelerator storage ring optimized for running in “low alpha mode,” in which the revolution time of the electrons becomes nearly independent from their energies.
“When we adjusted this isochronal property to its absolute technical limit, several physical effects appeared which are normally not seen in a storage ring,” Feikes says. “This physics had to be understood and its microbunch-destroying effects had to be mitigated by a sophisticated adjustment of the SSMB machine state.”

What’s next​

After this proof of concept, the Chinese-German team will extend the duration of the experiment from one lap around the storage ring (with a duration of only 160 ns) to many turns, with the final goal to maintain the microbunching at time scales in the order of many seconds, Feikes says.
Tsinghua University has delivered to the MLS a new laser with a very high repetition rate. According to Feikes, the laser will fire its pulses on every turn at exactly the same phase of the passing electrons. “With this, we will learn important issues concerning the time evolution of a microbunch and how to preserve its microstructure of a longer time period,” he says.
“The Tsinghua University is actually planning to construct the first SSMB-dedicated synchrotron light source near Beijing with special emphasis on high-power EUV generation for industrial applications as semiconductor lithography,” Feikes adds. “With this project approved soon, it might start its operation still in this decade. Here the demands on the technical infrastructure and physical conditions are tremendous, as the microbunches would be much shorter than in our experiment and would be continuously maintained in a ‘steady state’ while simultaneously radiating at high power.”
Publish Date: 03 March 2021
 

krautmeister

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If it has a narrower frequency band, that should mean its more reliable even with less mechanical controls? What's the standard deviation of the 13.5nm LPP light source compared to the current light source?
There is no standard deviation you can look up comparing LPP to SSMB EUV from public sources that I know of. Here's a good summary of SSMB for lithography.

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krautmeister

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@krautmeister Sir is this the article you been saying?
I didn't learn of the details from your posted link but it is the same information. It is more powerful than LPP EUV, it provides a coherent narrow band controllable spectrum of high power EUV light that needs fewer mirrors and thus delivers more EUV to the wafer than LPP EUV. So, it has higher source power EUV than LPP and delivers more of that EUV at the wafer than LPP. It is a next generation EUV light source.
 

ansy1968

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I didn't learn of the details from your posted link but it is the same information. It is more powerful than LPP EUV, it provides a coherent narrow band controllable spectrum of high power EUV light that needs fewer mirrors and thus delivers more EUV to the wafer than LPP EUV. So, it has higher source power EUV than LPP and delivers more of that EUV at the wafer than LPP. It is a next generation EUV light source.
@krautmeister Sir thanks for your explanation, I learned a lot, from what you posted, China is in the forefront regarding research of new tech especially the power source which is lacking at the moment. Sir from what I read its a collaboration is there a problem regarding IP? the US is using legal means to disrupt Chinese tech development.
 

WTAN

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@WTAN
What do you think of CTEC finished the 35nm duv design?

Cetc has 2 sets of 65nm duv in production in 2021.

中国机床工具协会原高级顾问邵钦作的发言。里面有提到光刻机的问题

邵钦作说:现在国产光刻机面临的难题,有很大一部分是光刻机核心零部件加工水平的问题。他说中电科的领导找到他,告诉他现在中电科已经设计好了35nm光刻机。里面几个关键部件需要精密加工,问他国产机床能不能胜任。他说选择给中电科挑选国产机床里面最好的,可以达到他们的精度要求。
Yes......i have read this news about the sucessful development by CETC of the 35nm DUVL.
This is a Major Breakthrough by CETC as this means that in term of Lithography Technology it has caught up with SMEE.
The CETC 35nm DUVL is basically equivalent to the SMEE 28nm DUVL.
SMEE and CETC uses different performance indicators for the DUVL.
CETC folllows ASML and describes the performance of the machine using Resolution. ASML 2000i/1980i Resolution is 38nm. CETC new DUVL resolution is 35nm. So CETCs new DUVL is equivalent to ASML 1980i.
SMEE chooses to describe its DUVL as having a 28nm Node Performance. Node means it can produce 28nm Chips using a Single Exposure.
But basically the New CETC Machine has the same Performance as the SMEE 28nm DUVL.
This is the case as it uses the same Subsystems and Parts as the SMEE DUVL.

This is a extremely significant event as China now has 2 Manufacturers of DUVL Machines.
CETC being the larger Manufacturer with larger scale and talent as well as finacial resources will now compete with SMEE.
CETC will also now certainly play a part in the development of China's first EUVL.
 

gelgoog

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A synchrotron light source? That seems kind of impractical because the machine will be huge.
You will need to design the facility around the synchrotron.
I can see it being used for either research or even military or government production but for commercial use seems kind of complex.
 

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