Why would CETC dual stage lithograph indicate they are ahead of SMEE in 14nm? This would only indicate their lithograph was more productive, but not necessarily ahead in process.
If SMEE alignment accuracy is indeed not on par with CETC, that is a different story. From what I know, SMEE immersion optics are stuck at NA 0.75 but there are rumors of new NA 1.35 optics in the works. News concerning patterning techniques like SADP are all rumors and a black box to the public at this point.