Chinese semiconductor industry

[Oldschool]

What is the NA of the CETC 35nm?

Similar to SMEE
Guo hwang supply both.

 

[BoraTas]

Similar to SMEE
Guo hwang supply both.

My field is not fab equipment. What prevents the immersion lithography machine from SMEE from printing 7-10 nm circuits? Aren't the optics and light source the same?

 

[Oldschool]

My field is not fab equipment. What prevents the immersion lithography machine from SMEE from printing 7-10 nm circuits? Aren't the optics and light source the same?

Guo hwang optics different than Zeiss.
Mechanical Control and overlay precision also different than asml

 

[Oldschool]

Guo hwang road map
Nothing on 14nm before 2024.

本项目拟于 2021 年 3 月开工建设，预计 2023 年 9 月竣工投产。项目建成后年产 20 套 ArFi/ArF/KrF/i-line 光刻机曝光光学系统（110nm节点、90nm节点、28nm及以下节点），该产品主要有机械加工生产线、光学元件生产线、镀膜生产线和装配线组成。

 

[Deleted member 15949]

Guo hwang road map
Nothing on 14nm before 2024.

本项目拟于 2021 年 3 月开工建设，预计 2023 年 9 月竣工投产。项目建成后年产 20 套 ArFi/ArF/KrF/i-line 光刻机曝光光学系统（110nm节点、90nm节点、28nm及以下节点），该产品主要有机械加工生产线、光学元件生产线、镀膜生产线和装配线组成。

@WTAN I believe clarifies whether this is a capacity expansion for the 1.35NA optics that already exist?
Overlay precision, methinks is the dual-stage system by Beijing U-Precision?

 

[Oldschool]

@WTAN I believe clarifies whether this is a capacity expansion for the 1.35NA optics that already exist?
Overlay precision, methinks is the dual-stage system by Beijing U-Precision?

It's expansion, before 2023 optics made by its branch changchun guo kua..

Dual stage is only needed for finfet and beyond.

 

[Oldschool]

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Taiwan bans head hunting semiconductor job postings for mainland.

China should ban TSMC 28nm in China.

 

[BoraTas]

Guo hwang optics different than Zeiss.
Mechanical Control and overlay precision also different than asml

Guo hwang road map
Nothing on 14nm before 2024.

本项目拟于 2021 年 3 月开工建设，预计 2023 年 9 月竣工投产。项目建成后年产 20 套 ArFi/ArF/KrF/i-line 光刻机曝光光学系统（110nm节点、90nm节点、28nm及以下节点），该产品主要有机械加工生产线、光学元件生产线、镀膜生产线和装配线组成。

If it can print 35 nm with a single exposure it means the optics are as capable as Zeiss optics. Can we conclude it is the alignment sensors that are missing?

Also, it says "28nm及以下节点".

 

[Oldschool]

If it can print 35 nm with a single exposure it means the optics are as capable as Zeiss optics. Can we conclude it is the alignment sensors that are missing?

Also, it says "28nm及以下节点".

Actually, I take it back on 14nm in 2024. It's smee roadmap.

Even if the current optics are capable of supporting lower nodes , smee only consider and build for 28nm at this moment, and improved version at 14nm in 2024.
It's a system engineering issue. Hardwares and software integration.

 

[Oldschool]

From that tidbit Chinese news, we only know cetc finished design the 35nm duv. And if it's dual stage then it leapfrog smee and it can go for 14nm at least

@WTAN, @foofy to keep an eye on this cetc duv.

Also euv and duv are parallel. Euv can come out in 2025. Who knows?