Yes it is clearly a leap in euv lithograph that the loght source is 150 kw to 400 kw however mass production of these machine remains an issue , other problems might be ziess lens which are incredibly hard to replicate cuz they have just 50 pecometer accuracy however we must consider china should have other ways to get euv machine maybe second hand who knows or other particle accelerator project
PLA Strategy in a Taiwan Contingency
- Thread starter pugachev_diver
- Start date
There are so many mistakes in Reuters article.
EUV mirrors are the critical component of entire EUV optical system.
China is been world class in optics at least since mid 2010's decade. EUV optics and Mirrors have completed in 2024. i can even send you the authorized patent of EUV optical system that Chinese institute applied.
just one example, in 2019 China made this highly complex large aspheric mirror. link is down below.
Zeiss EUV mirrors are the most precise human-made surfaces in the world, polished to a smoothness with an unevenness of just tens of picometers (pm), which is a fraction of a nanometer (nm). The required surface accuracy for a single mirror, THERE IS SOME MORE CACHING TO DO BUT THEY WILL DO IT NO MATTAR WHATThere are so many mistakes in Reuters article.
EUV mirrors are the critical component of entire EUV optical system.
China is been world class in optics at least since mid 2010's decade. EUV optics and Mirrors have completed in 2024. i can even send you the authorized patent of EUV optical system that Chinese institute applied.
just one example, in 2019 China made this highly complex large aspheric mirror. link is down below.
i m not denying the complexity. there is plenty of valuable information about China's EUV on semiconductor thread include optics/mirrors. we have posted each and every possible information on that thread. China successfully build entire supply chain of mirrors include tools/equipment and coating infrastructure.
They’ve already done it. Please look at more Chinese supply chain news. Don’t believe every marketing hype you see. Just because some performance numbers look impressive doesn’t mean the engineering process used to get those results are hard to replicate.
“Mass production” isn’t a challenge with this kind of equipment because what qualifies as “mass production” is not thousands or tens of thousands or millions of these machines a year but tens to hundreds.
So your telling china already has euv lithograph machines making chips sure they have progress and will make it however what are they compared to like asml euv nxe 3400 nxe 3600 etc ???
I’m telling you China already has all the components figured out. You can’t assemble a functional prototype without achieving that level of development first. They’re in the last stage of development and that last stage is all about optimization and calibration of prototypes units so that they can perform at a commercially acceptable level. I would recommend you learn how R&D for these complex systems work.
A Chinese EUV instrument doesn’t need to be as good as ASML’s to enable mass production of advanced nodes. Matching performance only matters for sales in an open market competition context, which doesn’t apply in an environment where ASML is banned.
Last edited:
What does any of this have to do with AR?
Sorry. I’m just zapping out miscomprehension about EUV wherever I see it. Feel free to delete or move my comments.
