Chinese semiconductor thread II

[sunnymaxi]

Honestly it's all weak rumours for now. I'd say a Chinese publications from mainland would be much credible.

''Huaweicentral'' website took this information from mainland like Weibo and twitter.. they don't have their own source. very simple

some people don't get this information accurate ever since the image got leaked on internet. let me clarify

that ''EUV interferometer'' picture is legit and from Zhejiang university's national laboratory. in that leaked picture we also saw the logo of SMEE and some code words like NGI/NGL. judging from image it seems they already have prototype.. this was expected outcome because we all have been following the EUV development process.

China have multiple EUV projects running around. in fact CIOMP project is almost completed.
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is this for Huawei ?? nobody knows. only rumors as of now..

 

[OptimusLion]

 

[european_guy]

Huawei will test EUV machine this year and mass produce next year.

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On huaweicentral

X tipster @MaWooKong (via

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) reveals that...

On

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Images shared by X accounts

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and

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indicate that...

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The interferometer is looking good...

This is a picture of the same interferometer for EUV optics that circulates since some days. This is not an EUV machine.

Incredible how wildly rumors snowball on the net!

 

[OptimusLion]

 

[dropout003]

Would you consider the points raised in

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article realistic or just baseless pessimism.

 

[sunnymaxi]

--

 

[sunnymaxi]

Would you consider the points raised in

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article realistic or just baseless pessimism.

i have already read this article.. i m stunned to see author shamelessly ignore all recent developments in past 2-3 years.. how the heck She ignore all this before writing such an article..

anyone can write the article on QQ with professional account.

but let me clarify ..

1. she didn't mention RSLaser. completely ignore

2. she didn't even mention U-precision.. i m sure, he even didn't know that, U-precision recently released interferometer for advanced nodes

3. she didn't even mentioned 200+ patents related EUV components

4. she didn't mention Lithography laser developed by Three different institutes

5. she completely ignored HUST/HIT/SIOMP institutes. those are the leading players.. she said, CIOMP worked on objective lens of DUVi.. which is not true. its totally false. Changchun Guoke only produced 0.75/0.82 lenses and Guowang produced immersion lens. even confirmed by havok.

5. she talked about 90nm Lithography still has issues.. which is a blatant lie

6. she also ignored, SMEE released 7nm tool for inspection and Optical metrology just last year and specially mentioned 7nm.

there are plenty more to discuss and point out.. but its enough. better to ignore this article. we still have many boomers in our society.

 

[JPaladin32]

https://twitter.com/i/web/status/1899417530826891678

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Huawei's almost fully domestic PC getting shown.

Aside from CPU, the cool part is that all the PMICs are also domestic. Unclear with GPU & memory chips.

Part of China's domestic PC drive

I'm curious to know which Kunpeng 920 it is. I heard from multiple sources that Huawei is employing the same naming scheme for Kunpeng. It's Kunpeng 920 for the one released in 2019, Kunpeng 920C for the one derived from Kirin 9010 and 920F from 9020. There is also one from Kirin 9000s which is powering their kC2 cloud instances right now. I guess we will never know until the PC gets released.

 

[tokenanalyst]

Would you consider the points raised in

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article realistic or just baseless pessimism.

I don't know this person expertise but i think it looks like she is getting a lot of things wrong.

I think she is confusing the resolution with the process node, in this case is 65nm. The process node depend not only on the CD but also and very importantly the overlay, without the overlay you can have EUV resolution and still be limited by the overlay.
K1 = 0.25 is not the "current progress of lithography" is the physical limit of a lithography system. It will be less effort for China to increase the NA of the lens system than reaching 0.25 for a dry litho system.
I think a value more acceptable would be 0.3 that for a resolution of 65nm that will give NA of 0.90

The term SSA800/10W NEEDS TO DIE, I don't know where this term comes from. O course the immersion scanner is NOT going to be 10W, there will not point of creating such system for anything. In 2018 China Dry 193nm 4KHZ excimer lasers reached 40W, I already posted that years ago and the immersion system is going to be 60W.

 

[sunnymaxi]

The term SSA800/10W NEEDS TO DIE, I don't know where this term comes from. O course the immersion scanner is NOT going to be 10W, there will not point of creating such system for anything. In 2018 China Dry 193nm 4KHZ excimer lasers reached 40W, I already posted that years ago and the immersion system is going to be 60W.

i replied to this question.. just check my massage above. she basically know absolutely nothing about Lithography. and got completely out of touch with all latest development and progress done by Chinese institutes in past few years.

she literally said 10W light source for immersion scanner.. WTFFF


havok said in March 2023, 60W 6KH light source for ArFi validated.................