The Federal Circuit ruled against Micron, meaning Micron must provide the 73 pages of source code to YMTC’s legal team under the terms of the protective order.
For the context :
For the context :
Chinese semiconductor thread II
- Thread starter vincent
- Start date
Chang Lin's team from the School of Electronics at Peking University has made significant progress in the field of photonic chip clocks
The research team of Chang Lin from the School of Electronics and the research team of Li Wangzhe from the Institute of Space Information, Chinese Academy of Sciences, published a research article titled "Microcomb-synchronized optoelectronics" online in Nature Electronics, realizing the application of photonic chip clocks in information systems for the first time in the world. This technology is based on mass-produced ultra-low-loss silicon nitride photonic chips, and generates high-precision, low-noise clock signals through optical frequency combs, breaking through the performance bottlenecks of traditional electronic chips in terms of clock bandwidth, energy consumption and noise. It provides an important solution for the development of future ultra-high-speed chips.
The research team of Chang Lin from the School of Electronics and the research team of Li Wangzhe from the Institute of Space Information, Chinese Academy of Sciences, published a research article titled "Microcomb-synchronized optoelectronics" online in Nature Electronics, realizing the application of photonic chip clocks in information systems for the first time in the world. This technology is based on mass-produced ultra-low-loss silicon nitride photonic chips, and generates high-precision, low-noise clock signals through optical frequency combs, breaking through the performance bottlenecks of traditional electronic chips in terms of clock bandwidth, energy consumption and noise. It provides an important solution for the development of future ultra-high-speed chips.
Niao Optoelectronics completed nearly 100 million yuan in A+ round of financing, leading the new era of industrialization of thin-film lithium niobate optical chips
The joint venture company Niao Optoelectronics announced the successful completion of nearly 100 million yuan in A+ round of financing. This round of financing was led by Jinpu Intelligent, a well-known domestic venture capital institution, followed by Guangzhou Industrial Investment and Wanlian Guangsheng, and the company's original shareholders Nanjing Innovation Investment Group and Yida Capital continued to make additional investments. It fully demonstrates the capital market's high recognition and firm confidence in its development potential. This round of financing focuses on the large-scale mass production of thin-film lithium niobate optical chips and the technical layout of cutting-edge fields such as the next-generation intelligent computing cluster optical interconnection, laser radar, and optical computing, further consolidating Niao Optoelectronics' global leading position in the field of thin-film lithium niobate optical chips
The joint venture company Niao Optoelectronics announced the successful completion of nearly 100 million yuan in A+ round of financing. This round of financing was led by Jinpu Intelligent, a well-known domestic venture capital institution, followed by Guangzhou Industrial Investment and Wanlian Guangsheng, and the company's original shareholders Nanjing Innovation Investment Group and Yida Capital continued to make additional investments. It fully demonstrates the capital market's high recognition and firm confidence in its development potential. This round of financing focuses on the large-scale mass production of thin-film lithium niobate optical chips and the technical layout of cutting-edge fields such as the next-generation intelligent computing cluster optical interconnection, laser radar, and optical computing, further consolidating Niao Optoelectronics' global leading position in the field of thin-film lithium niobate optical chips
BYD's factory has started the large SiC fab globally & a 8 inch wafer factory has started too (unclear if that's Sanan being referred to)
BYD's fab is increasing production right now, large amount of 1200V SiC product getting produced.
The construction of the Yuehao Semiconductor Display Equipment and Key Components Manufacturing Base Project started
The groundbreaking ceremony for the Yuehao Semiconductor Display Equipment and Key Components Manufacturing Base Project was held in Chuzhou, Anhui. W
Yuehao Electronics is a high-end vacuum solution provider focusing on the semiconductor display field, providing first-class vacuum coating equipment, key components and technical services to global customers. In the past three years, the company's revenue has achieved an average annual growth of more than 50%. The company will take this groundbreaking ceremony as a starting point to accelerate project construction, strive to start production as soon as possible, promote the sustained and rapid development of the enterprise, and make positive contributions to local economic development.
The Yuehao Semiconductor Display Equipment and Key Components Manufacturing Base Project is located in Nanqiao Economic Development Zone, Chuzhou City. The first phase of the project covers an area of 124 acres, with a construction area of about 100,000 square meters. It is planned to build intelligent production workshops, R&D centers and supporting bases. After the project is completed, it can provide customers with domestically produced semiconductor display vacuum coating solutions at the international advanced level. The equipment product series includes: sputtering coating equipment for high-generation displays, mask coating equipment, roll-to-roll magnetron sputtering coating equipment, atomic layer deposition equipment, In-line magnetron optical coating equipment, and semiconductor advanced packaging TGV coating equipment.
A new project of high-purity and functional electronic chemicals in Anhui
The project covers a total area of 106.9 mu, the main structure is built at one time, and the production equipment is invested in phases. It mainly includes 1 Class A production workshop, 1 Class C production workshop, supporting tank area, loading and unloading area, public works, sewage treatment, waste gas treatment and other facilities. After completion, the first phase will produce 85,000 tons of ultra-high purity general electronic chemicals and 25,000 tons of functional formula electronic chemicals annually, and produce 8,000 tons of 31% hydrogen peroxide, 2,000 tons of 49% hydrofluoric acid and 1,000 tons of 20% hydrochloric acid as by-products. The second phase will increase the annual production of 125,000 tons of ultra-high purity general electronic chemicals and 15,000 tons of functional formula electronic chemicals, and produce 8,000 tons of 31% hydrogen peroxide, 4,000 tons of 49% hydrofluoric acid and 1,000 tons of 20% hydrochloric acid as by-products.
Interesting tidbit on Huawei (presumably lithography related) from the Manifold Podcast below
youtube.com/watch?v=fmjR3me5s_Q&list=PLDtK-oqJj1JeUEAbyG-aIXrYdxpB5mI7E
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"Huawei (unlike most other Chinese companies) are treating US technology sanctions like a wartime situation"
"Huawei has 2 "breakthrough" teams, voluntarily working non-stop 24/7"
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So my personal revised guess is that now, we'll see a Chinese EUV lithography machine in less than 4 years.
youtube.com/watch?v=fmjR3me5s_Q&list=PLDtK-oqJj1JeUEAbyG-aIXrYdxpB5mI7E
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"Huawei (unlike most other Chinese companies) are treating US technology sanctions like a wartime situation"
"Huawei has 2 "breakthrough" teams, voluntarily working non-stop 24/7"
---
So my personal revised guess is that now, we'll see a Chinese EUV lithography machine in less than 4 years.
antiterror13
Brigadier
4 years means 2029 ... I think would be earlier than that. If you meant was mass production, I agreed
lol, Taylor literally said the plant for it is operational right now. What is wrong with you?
If you believe what he said, then it is already being tested or getting close to start testing.
If you take what he says seriously, then your conclusion is bad. If you don't take what he says seriously, then why are you posting it?
Overlay-aware Variation Study of Flip FET and Benchmark with CFET
Abstract
In this work, we carried out an overlay-aware variation study on Flip FET (FFET) considering the impact on RC parasitics induced by lithography misalignment in the backside processes, and benchmarked it with CFET in terms of the power-performance (PP) and variation sources. The iso-leakage frequency degrades up to 2.20% with layout misalignment of 4 nm. It’s found that the Drain Merge resistance degrades significantly with misalignment increasing and is identified as the major variation sources. Through careful DTCO with design rules optimization, the variation can be greatly suppressed, while the resistance fluctuation of the DM also drops substantially. Monte Carlo random experiments were also conducted, validating the variation reduction. Comparing with the CFET featuring selfaligned gate and much less overlay induced misalignment, fortunately, FFET’s PP is still better except when misalignment reaches 8 nm, which is out of spec and nearly impossible. Considering the variabilities induced by the high aspect ratio processes, CFET still faces big challenges compared with FFET.
