Chinese semiconductor thread II
- Thread starter vincent
- Start date
Who the fuck cares, better for the world to underestimate China until Techinsights actually has a Chinese 2nm GPU in their lab for a teardown. All the China doomers are actually a good thing for China, by feeding the public and the government misinformation. Just look at the amount of shit China has gotten away with due to the whole 'There's no way China can innovate, they are 20 years behind us, this sanctions will finish them for good' attitude that results in piecemeal sanctions that just motivate the chinese semiconductor sector more, rather than an actually massive sanction package early on that could actually hurt China.
I also used to get angry at all the misinformation, chinese doomers and all the 'China is close to collapse, China is 20 years behind" but now I actively cheer the misinformation on, since it's not just the public that's affect but the highest level of government. Underestimating China is a national pastime for America.
Would Nixon have warmed ties with China and opened China up if he knew that China had the potential to be a peer superpower? Would America have shipped all her low-mid tier manufacturing and IP to China if they knew that China would quickly becoming a peer competitor in basically every field, instead of remaining as a low wage sweatshop forever? Would Trump/Biden have slapped piecemeal sanctions on China if they knew that China would contanstly innvovate their way out and just get stronger? If America didn't contastly underesimate China, they would have done a lot more to stop her rise. Trump could have slapped the mother of all sanction packages on China in 2018, restricting everything and stopping the semiconductor industry cold before they could scale up if they actually treated China seriously.
Method for forming semiconductor structure
A photolithography system, photolithography method and positive image projection system based on 1:1 positive image projection imaging
Multi-facet semiconductor device for gate-all-around integrated device
Multi-probe lithography equipment and lithography method
Vacuum etching control system and vacuum etcher
New progress in the research and development of 13.5nm extreme ultraviolet lithography light source in China—— Breakthrough in high conversion efficiency
Lin Nan's team from the Shanghai Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, has achieved a 3.42% conversion efficiency of 1 μm solid laser to 13.5 nm extreme ultraviolet light on the laser-driven plasma extreme ultraviolet (LPP-EUV) light source experimental platform they established, and the single pulse energy of 13.5 nm extreme ultraviolet at the main focus exceeded 20 mJ, which is at the international and domestic leading level. The LPP-EUV light source experimental platform established and the research results of the new mechanism of extreme ultraviolet generation by laser plasma carried out with the help of this platform provide technical support for the localization research and development of solid laser-driven LPP-EUV lithography light sources, which is of great significance for China to independently carry out the research and development of EUV lithography and its key devices and technologies.
Lin Nan's team from the Shanghai Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, has achieved a 3.42% conversion efficiency of 1 μm solid laser to 13.5 nm extreme ultraviolet light on the laser-driven plasma extreme ultraviolet (LPP-EUV) light source experimental platform they established, and the single pulse energy of 13.5 nm extreme ultraviolet at the main focus exceeded 20 mJ, which is at the international and domestic leading level. The LPP-EUV light source experimental platform established and the research results of the new mechanism of extreme ultraviolet generation by laser plasma carried out with the help of this platform provide technical support for the localization research and development of solid laser-driven LPP-EUV lithography light sources, which is of great significance for China to independently carry out the research and development of EUV lithography and its key devices and technologies.
Putting the picture of the researcher is unnecessary.