What advantages does the upcoming ASML High NA EUV machine have over their current EUV machine? Why does it cost twice the price of current machine. According to this article Intel has already ordered the first unit for more than $340 million. It says normally also this model will cost $300 million while the current one sells for $150 mil.
@huemens bro from the article "ASML said it has received orders for five prototypes of the next iteration of the system, known as "High NA" EUV machines,
which will have a different optical system with a higher numerical aperture, will be even larger, and cost around $300 million each." My questions to the experts will they used the same LPP light source? Current EUVL is capable of 13 resolution compare to 8nm for this new High NA EUVL, does it need a new photomask and photoresist?
And now comparing this to the plan Chinese EUVL, IF using SSMB will the performance be the same? IF one SSMB facility cost about $180 -$200 million dollars, then it's cheaper compare to one HIGH NA EUVL machine costing $318 million? and from Mark Lapedus column below the expected entry date is 2023-24 just a year ahead before the Chinese EUVL introduction in 2025.
ASML’s first high-NA EUV system, the EXE:5000, features 8nm resolutions with a throughput of 150 wph. Customer shipments are slated for 2023. Then, at the end of 2024, ASML will ship a new version, the EXE:5200, which has a throughput of 220 wph.
Oct 21, 2021 —
High-
NA EUV works like today's
EUV lithography, but there are some key differences. Instead of a traditional lens, the
high-
NA tool incorporates ...
