Chinese semiconductor industry
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@horse hahaha!!! bro I'm a leg person Not a fan of Big Butt...lol. From @krautmeister previous when he mentioned the possibility I was awestruck, I mean here is a tech that will help China leapfrog the rest, a WunderWaffe, from my reading a Synchrotron facility cost about $120-150 million same amount with NXT 3400 EUVL, So from cost benefit analyst it is better and the performance parameter is greater. Man Liu He is not a guy to mess around with, he is taking his job seriously and wanted to invited back again by Trump in 2025 to show him whose the boss....lolMan, that is like 80x times the butt hertz!?
This is like a full frontal attack, and attack along the sides too.
This is not guerilla tactics hit and run, this is the final battle for ultimate control of the country/battlefield, blah blah blah.
Damn it brother, I truly did not see this coming.
This is everything, like right now!
- DUV today for SMIC full indigenous equipment for the 28nm 14nm nodes - today
- advanced chip stacking and packing to compete at 7nm or even 5nm nodes - one year or two years away
- EUV with gigantic synchrotron setup complete with precision workbench - two years or four years away
That's it! I am getting out of here, and running for my life! I don't want to get my ass zapped by that synchrotron light source! I won't be able to handle the butt hertz!
Run!
@horse Bro I wish you're a fan of China civil war, from the way it flow and ebb is like the Battle of Huaihai Campaign. With Liu He playing the role of SU YU. The CCP instead of reacting to enemy threats and action chooses to take the initiative asymmetrically and like you said it is the first time they use a conventional tactic.
I hope that debate will shift to 7nm chips and below , the EUVL and my perspective I may be wrong the future SSA900 22NM DUVL. On the last part I'm really intrigue cause that thing from what I read and know had finished its R&D. I want to hear more from it.Damn it brother, I truly did not see this coming.
This is everything, like right now!
That is the whole mo-fo-ing stack, the entire mo-fo-ing industry brother. I did not see this coming. It was a full frontal attack!
- DUV today for SMIC full indigenous equipment for the 28nm 14nm nodes - today
- advanced chip stacking and packing to compete at 7nm or even 5nm nodes - one year or two years away
- EUV with gigantic synchrotron setup complete with precision workbench - two years or four years away
That's it! I am getting out of here, and running for my life! I don't want to get my ass zapped by that synchrotron light source! I won't be able to handle the butt hertz!
Run!
The conversation regarding the other stuff like SMEE SSA800 28NM ,14nm chip is done and dusted. There is nothing more to explained and from those who don't believed are mostly trollers and haters...lol
Yes......the NSLS Synchrotron in New York built in the 1980's has 80 Beam Lines or Light Source Experimental Stations which are available for use by Researchers.
So yes......if all the Beam Lines are used, you could have 80 Units of EUVL Machines operating simultaneously.
No wonder the CIA burnt down the ASML Factory in Germany.....LOL! Just Kidding Folks.
I believe SSMB and LPP is simultaneously being developed.
They are developed simultaneously to cover any delays or technical glitches, patent disputes etc. affecting any one method.
LPP is still under development by Shanghai Institute of Optics and they are looking for a Breakthrough in Laser Power.
I havent heard much about DPP lately.
Alot of news on Light Source development is focused on SSMB at the moment as Old School has also confirmed.
There is a very high chance that SSMB will be available for use as a Light Source for EUVL by 2025.
The new Beijing Synchrotron facility or any other new facility built by Tsinghua Uni would help in the Industrialisation of this Light Source.
The CAS is very confident in this technology and they know quite alot about it having built Synchrotrons for decades.
There are also no IP Issues unlike the LPP EUVL machine.
Also scalable in power allowing it to be used for decades in the future unlike ASML EUVL machines which become obsolete quickly.
@WTAN Sir LPP for export? to recoup its investment, that will surely ruin ASML! Sir the high probability of SSMB success with CAS having experience, with parallel development will that be wasteful?
Or maybe I'm speculating here IF both are successful, will SMEE and CETC develop a LPP version for foreign FAB user, that strategy is a super win/win for both.
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It is a common strategy in China to simultaneously develop different technology to ensure success in certain areas. This is common in the Military/Arms development Industries.
The Chinese Gov as you know is spending big on technology and Lithography is one area of focus.
Yes....if LPP is sucessful, they will export the machines overseas. They need to recoup the money spent on developing the EUVL Machines.
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