In case anyone wonder1 is the diffraction limit for dry lithography, ASML latest dry scanner variable from 0.70NA to .93NA but even if the twitter "Taiwanese" stooge says is true (he doesn't present any evidence) is irrelevant, dry litho is barely used today, the sale number from ASML are low. 0.85NA is capable of satisfying most of the needs in dry ArF lithography. The work horse of lithography are KrF and Immersion scanners.
The twitter guy seriously shows his lack of knowledge by citing the old 40W ArF excimer laser the RSLaser showcased in 2018, HARD evidence points out the RSLaser already has mastered 90W 6KHZ ArF immersion light source.
Twitter as most social media is crap for good information.
.0.25 * (193/0.85)= 57nm

ASML doesnt even care.
What really matter is the overlay that for the 65nm was announced as 8nm below
Resolution / 3 = 57 / 3 = 19nm way above the 8-7nm that was announced
And yes that is the twitter stooge "insider", the Ministry of industry announcement and old 2018 news about RSLaser.