I can't believe two very important tools in traditional IC induatry that China has no domestic suppliers. Those two tools also needed for EUV.
One is EBL electron beam lithography that used to make traditional chrome on glass design mask and which is also used for EUV mask.
The second is focused ion beam FIB, which is used for circuit edit in traditional IC industry and also for EUV mirror surface fine milling.
The fundamental technology behind those two is based on SEM scanning electron microscope. That China has supplier.
So, for starter, they need to have research institutes to partner up with industrial guys to make those two tools.
Patching up the weak foundation first.
After that need special interferometer for metrology to characterize high frequency error on the mirror.
And atomic force microscopy for low frequency error.
That's why I said need the whole country to pitch in because the EUV industry is very broad need alot of different tools.
A top level government taskforce is absolutely needed to coordinate the whole thing!
One is EBL electron beam lithography that used to make traditional chrome on glass design mask and which is also used for EUV mask.
The second is focused ion beam FIB, which is used for circuit edit in traditional IC industry and also for EUV mirror surface fine milling.
The fundamental technology behind those two is based on SEM scanning electron microscope. That China has supplier.
So, for starter, they need to have research institutes to partner up with industrial guys to make those two tools.
Patching up the weak foundation first.
After that need special interferometer for metrology to characterize high frequency error on the mirror.
And atomic force microscopy for low frequency error.
That's why I said need the whole country to pitch in because the EUV industry is very broad need alot of different tools.
A top level government taskforce is absolutely needed to coordinate the whole thing!
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