Chinese semiconductor industry

Status
Not open for further replies.

Skywatcher

Captain
Hmm ok, that makes more sense. ASML quotes their machines at 38nm resolution, which is single exposure resolution. If we assume that ssa800 can achieve a single exposure of around 38 or 40nm (depending on Numerical aperture and wet immersion), Theoretically assuming good overlay performance, 7nm would be possible?
Yes. Naura already has microelectronic components good enough for 14/16nm processing, so SMEE could likely have access to such similar microelectronics for overlay performance.

As for the "lowest resolution" on SMEE's site, my guess is that they don't put very much effort into their website.
 

free_6ix9ine

Junior Member
Registered Member
Yes. Naura already has microelectronic components good enough for 14/16nm processing, so SMEE could likely have access to such similar microelectronics for overlay performance.

As for the "lowest resolution" on SMEE's site, my guess is that they don't put very much effort into their website.

Im not an expert in semiconductor, but I'm assuming you would need to scan a single wafer 6 times at 40 nm single pattern resolution to achieve 7nm, while adjusting the mask each time? Is that correct? While 13.5 nm single pattern resolution you can achieve 7nm with 2 scans?
 

free_6ix9ine

Junior Member
Registered Member
Yes. Naura already has microelectronic components good enough for 14/16nm processing, so SMEE could likely have access to such similar microelectronics for overlay performance.

As for the "lowest resolution" on SMEE's site, my guess is that they don't put very much effort into their website.

Also why doesn't china skip euv and start researching gamma ray lithography or X-ray which is 100 pm?
 

Skywatcher

Captain
Im not an expert in semiconductor, but I'm assuming you would need to scan a single wafer 6 times at 40 nm single pattern resolution to achieve 7nm, while adjusting the mask each time? Is that correct? While 13.5 nm single pattern resolution you can achieve 7nm with 2 scans?
Yes (though I honestly don't know the exact number of times you need to scan the wafer)
 

Canuck place

New Member
Registered Member
Ignore my previous comments about SMEE 28 NM machine being able to make 7NM chips. I've gotten someone who can read Chinese to translate the SMEE website for me. It seems that SMEE uses the definition of resolution as the smallest node that the machine can produce. This is different from how ASML defines resolution.

ASML machine with 38 nm resolution can produce 7nm chips.

SMEE 28nm resolution cannot produce 7nm chips. The smallest node/chip that SMEE 28 nm can produce is 28nm.

So global times is right and I am wrong. This means that this isn't the breakthrough we are looking for and we are literally many years away from domestic lithograph that can produce 7nm chips.

That is very unfortunate if that's the case. But at least we know that China has to talent to design chips which can compete with the world best. It may take a while longer to make them.
 

free_6ix9ine

Junior Member
Registered Member
I suspect that you'd probably need as much resources to research gamma/x ray lithography (there are also performance issues, IIRC, regarding photomasks and decreased accuracy) and EUV has already been proven to work.

I see. But a good thing about gamma ray lithography is we can skip the tin dropper LPP Light source. Instead, we can hook it up to one of our nuclear reactors and get massive amounts of gamma ray lol.
 

free_6ix9ine

Junior Member
Registered Member
Even more cool would be using a particle accelerator beam to carve into the wafer. If we had that level of technology. We can skip lithography all together. Since there would be no need for a mask anymore.

That way we don't need to manufacture mask or remove it.
 

Tyler

Captain
Registered Member
It looks like the increasingly ridiculous sanctions will result in the Yankees alienating the whole world and being isolated itself.
 
Status
Not open for further replies.
Top