Chinese semiconductor industry

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free_6ix9ine

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Don't know if this has been posted before. But this is a big breakthrough from China for scaling up the manufacturing of post silicon chips. We need to double and triple down on carbon nanotube chips development.

MIT built a chip with imperfect carbon nanotube that had the same performance as a silicon chip but with 10x less the power consumption.

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If we are able commercialize the production of high quality carbon nano tubes in the next few years, which is very possible, because this is not a complete redesign of current chips, but substituting silicon for carbon nanotubes, so we are not starting from scratch. If we are successful, We can crush TMSC and neutralize a lot of their advantages. It might even be faster than than to re-engineer the current process.
 

free_6ix9ine

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Given US posturing China should just steal the tech and patent it before the Americans do.
what do you mean? This is actually an area we are ahead of the US. Let's double down on this research and protect our own IP.
 

Hexon

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what do you mean? This is actually an area we are ahead of the US. Let's double down on this research and protect our own IP.
My bad, in that case we should do what the americans are doing and topping their scientists to ensure they never get ahead.
 

foxmulder

Junior Member
Trade/tech war will be difficult for China for a while (2-3 years) but after that China will be the winner with bigger market and more independent supply. Loser will be USA with smaller market and decreased revenues hence decreased R&D budget. Other winners will be obviously Japan ans South Korea.

Very succinct article from BCG:

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Skywatcher

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I guess I misunderstood in the past. I thought the 28nm immersion lithography machine can do chips lower than 28nm. I guess it can only do 28nm chips ? So can't do 14nm or 10nm at all? It's still a good achievement but sadly will not help Huawei or SMIC in the near future.
It can print 28nm features. For features down to 7nm, you need the SMEE machine to utilize a combination of the immersion, along with multiple pattern exposures.
 

free_6ix9ine

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Wonder if SMEE will be the manufacturer for Changchun's EUV technology?

China has developed EUV light source ? This is big news if confirmed. I read an article about an experimental UV lithography machine developed by China, but it clearly doesn't use euv light source and is only for the laboratory.
 

Canuck place

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It can print 28nm features. For features down to 7nm, you need the SMEE machine to utilize a combination of the immersion, along with multiple pattern exposures.
So theoretically can this machine get down to 10nm chips? I think that's the main issue right now.
 
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