Chinese semiconductor industry

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tokenanalyst

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Since 1990s, CIOMP has been focused on the research of EUV/X-ray imaging technology, especially in EUV light source, ultra-smooth surface polishing technology, EUV multilayer and correlation technology. And those aforesaid techniques form the applicative foundation of EUV optics. In 2002, the first EUV lithography prototype in China was developed, which verified the EUV lithography in principle. In 2008, EUV lithography technology was listed as a key research task in "32-22nm equipment technology forward-looking research" by the major project. CIOMP carried out the project of “The research on the key technologies of extreme ultraviolet lithography” as a leading organization, together with partners such as CAS Institute of Optics and Electronics, CAS Shanghai Institute of Optics and Fine Mechanics, CAS Institute Microelectronics, Beijing Institute of Technology, Harbin Institute of Technology, Huazhong University of Science and Technology.

The research team insisted the scientific spirit of perseverance, concentrates on the research, and accumulates propound knowledge. With eight years’ hard work, they have mastered a series of core technologies that limit the development of Chinese EUV lithography, such as ultrahigh accuracy aspheric mirror fabrication and testing, EUV multilayer, projection system integration and test, etc. A two-mirror EUVL objective system with the wave-front aberration better than 0.75 nm RMS was developed successfully, and a EUV lithography exposure apparatus was constructed. Using the apparatus, they achieved the first photoresist exposure pattern with 32 nm linewidth by EUV lithographe core technologies of Chinese EUV lithography. At the same time, the implementation of the project hy in China. They established a relatively perfect research and development platform for key technology of exposure optical system, complete successfully the research contents and tasks of national major project, achieve leapfrog development in EUV optical imaging technology, and enhance significantly contributed the establishment of a stable research team, and trained talents for our country to achieve sustainable development in the next generation lithography technology.

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The idea of companies like CTEC using an "EUV machine" for low-volume patterning of advanced chips for the Chinese military is not as crazy as some might think. Even a machine that only produces 10-20 WPH is much faster than what an ebeam lithography machine can produce. It's not even close to a machine that can be used in commercial production and probably super expensive. But much more productive than e-beam lithography.

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FairAndUnbiased

FairAndUnbiased

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tokenanalyst said:
Since 1990s, CIOMP has been focused on the research of EUV/X-ray imaging technology, especially in EUV light source, ultra-smooth surface polishing technology, EUV multilayer and correlation technology. And those aforesaid techniques form the applicative foundation of EUV optics. In 2002, the first EUV lithography prototype in China was developed, which verified the EUV lithography in principle. In 2008, EUV lithography technology was listed as a key research task in "32-22nm equipment technology forward-looking research" by the major project. CIOMP carried out the project of “The research on the key technologies of extreme ultraviolet lithography” as a leading organization, together with partners such as CAS Institute of Optics and Electronics, CAS Shanghai Institute of Optics and Fine Mechanics, CAS Institute Microelectronics, Beijing Institute of Technology, Harbin Institute of Technology, Huazhong University of Science and Technology.

The research team insisted the scientific spirit of perseverance, concentrates on the research, and accumulates propound knowledge. With eight years’ hard work, they have mastered a series of core technologies that limit the development of Chinese EUV lithography, such as ultrahigh accuracy aspheric mirror fabrication and testing, EUV multilayer, projection system integration and test, etc. A two-mirror EUVL objective system with the wave-front aberration better than 0.75 nm RMS was developed successfully, and a EUV lithography exposure apparatus was constructed. Using the apparatus, they achieved the first photoresist exposure pattern with 32 nm linewidth by EUV lithographe core technologies of Chinese EUV lithography. At the same time, the implementation of the project hy in China. They established a relatively perfect research and development platform for key technology of exposure optical system, complete successfully the research contents and tasks of national major project, achieve leapfrog development in EUV optical imaging technology, and enhance significantly contributed the establishment of a stable research team, and trained talents for our country to achieve sustainable development in the next generation lithography technology.

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The idea of companies like CTEC using an "EUV machine" for low-volume patterning of advanced chips for the Chinese military is not as crazy as some might think. Even a machine that only produces 10-20 WPH is much faster than what an ebeam lithography machine can produce. It's not even close to a machine that can be used in commercial production and probably super expensive. But much more productive than e-beam lithography.

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A cheap, small EUV system for highly specialized chips may be useful. I can think of a few low volume ASICs that may require EUV.

However it can't replace ebeam for mask production.
 
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tokenanalyst

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FairAndUnbiased said:
A cheap, small EUV system for highly specialized chips may be useful. I can think of a few low volume ASICs that may require EUV.
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That will be a dream machine for some armies.
SMEE 90nm dry Arf machine is probably more than a overkill for 90% of the Chinese military chips needs but even with the best lenses, stages and software my guess will be able to only reach 65nm. Even with an immersion lithography machine there is still the need for complicated multi-patterning techniques to reach 22nm-28nm that for low volume only complicate things. So EUV is perfect for this kind of stuff, my guess is that there is not for multiple patterning for 28nm even with low NA.

FairAndUnbiased said:
However it can't replace ebeam for mask production.
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Of course, will be redundant to need a expensive mask to make an expensive mask, direct writing methods like laser lithography and e-beam lithography are better for that purpose, apart for being able of patterning bigger areas.
 
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gadgetcool5

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tokenanalyst said:
This is not the topic of this thread but the United States did not created the "globalized economy", globalization is an agreement between multiple nations, existed even in the context of the cold war but between three blocks (the Western bloc, Communist bloc and the rest of the world) . What the United States did was using after the cold war their huge socio-economical, military, technological leverage to influence the globalization trend in their favor.
For all intended purposes could have been the European Union the top dog, but they decided to happily live under the American shadow or Japan, but they are too small.
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Globalization in retrospect was just a modernized version of the unequal treaties of the 19th century. Most poor countries were forced to "agree" to it only under threat of financial crisis, debt traps, military coups, or outright occupation. This started soon after 1945 in the Western bloc and gradually expanded to cover the entire world in the 1970s to 2000s. It's a myth that it was voluntary or under equal terms. That is Western propaganda.

The whole premise is the same as the 19th century European imperialist project. To open up the world to the West's superior goods. The superior goods are defined as the most supply chain critical/technologically advanced ones where the US/West can achieve a protected monopoly and thus get the highest profit margin. Lower value added was outsourced. What most countries originally wanted to do was build up their own industries to be equal to the West and "catch up", e.g. import substitution. The Western elites were elated when this failed in most countries.
 
FairAndUnbiased

FairAndUnbiased

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gadgetcool5 said:
Globalization in retrospect was just a modernized version of the unequal treaties of the 19th century. Most poor countries were forced to "agree" to it only under threat of financial crisis, debt traps, military coups, or outright occupation. This started soon after 1945 in the Western bloc and gradually expanded to cover the entire world in the 1970s to 2000s. It's a myth that it was voluntary or under equal terms. That is Western propaganda.

The whole premise is the same as the 19th century European imperialist project. To open up the world to the West's superior goods. The superior goods are defined as the most supply chain critical/technologically advanced ones where the US/West can achieve a protected monopoly and thus get the highest profit margin. Lower value added was outsourced. What most countries originally wanted to do was build up their own industries to be equal to the West and "catch up", e.g. import substitution. The Western elites were elated when this failed in most countries.
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You are 90% right. But the secret actually is not in maintaining industrial capability for the most top tier products. That is expensive, has high risk due to small market size (nobody buys EUV lithography instruments every day after all) and frankly, unnecessary.

you want to know the real secret? Super profits actually come from setting standards and owning the regulators.

Example: why does C919 have shit like seats or black boxes imported? China can't make a seat? China can't put a voice recorder in a metal box? Lol really?

It's because of regulatory monopoly where their standards are what things are judged by. Standard setting and regulatory monopoly force everyone else to play by their rules. And most of all this is essentially risk free.

That is how you can get super profits like selling a metal box with a voice recorder inside, costing maybe $100 to make, for $50000.

Another example: why is Ukraine poor? They had tons of shit to sell in 1991 like gas turbines, rocket engines, etc. But because of regulatory monopoly and standards being captured by the west the only people to buy their stuff was China and Russia... Nobody else needed intermediate components from them, 3rd world countries need the whole product, west just says their stuff doesn't meet some obscure regulations and protects their industry, and bam, Ukraine is just as poor now as it was in 1992.
 
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tokenanalyst

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The rise of top 10 IC design companies in China​


China, the world's leading consumer of semiconductors, is undergoing a third semiconductor shift in tandem with the development of 5G, consumer electronics, and AI. Owing to the shift of the semiconductor industry – growing downstream demand, and strong support from the government, China's IC design industry has grown rapidly in recent years.
China's IC design industry has remained active in recent years, with the number of related companies continuing to rise. The following statistics from the ICCAD showed the number of IC design companies in China reached 2,810 in 2021, compared to 2,218 in 2020, a 26.7% increase. It is worth noting there were only 1,780 local IC design companies in 2019, showing significant growth in the last two years. (To have a complete understanding of the major player in the IC design industry in China, please download the full report of "DIGITIMES'
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In addition to the traditional IC design industry hubs of Beijing, Shanghai, and Shenzhen, there are more than 100 design companies in each of the following cities: Wuxi, Hangzhou, Xian, Chengdu, Nanjing, Wuhan, Suzhou, Hefei, and Xiamen. Based on this, the number of design companies in China will continue to increase and the cluster effect in the industry is poised to become more obvious.
In terms of size, 413 IC design companies were expected to see sales exceed CNY100 million in 2021, compared to 289 companies in 2020, for an increase of 42.9%. Sales for these 413 companies amounted to CNY328.8 billion in 2021, up from CNY305 billion the year before, accounting for 71.7% of overall industry sales.
Credit: DIGITIMES


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HereToSeePics

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caudaceus said:
Speaking about exaflops, there are still no exaflops system on top 500 benchmarks.
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The news broke last year of LINPACK benchmarking results that wasn't published

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This system is a successor to the Sunway TaihuLight, officially China's most powerful supercomputer. In March, China tested Oceanlite to the Linpack benchmark and it hit 1.3 exaflops peak performance with 1.05 sustained performance, with a 35MW power consumption.
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It's an open secret in the high performance computing world that China achieved exaflop performance sometime last year but chose to keep it under the radar to avoid scrutiny from US tech policy makers and avoid potential tech sanctions that would complicate things.

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hullopilllw

hullopilllw

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HereToSeePics said:
The news broke last year of LINPACK benchmarking results that wasn't published

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It's an open secret in the high performance computing world that China achieved exaflop performance sometime last year but chose to keep it under the radar to avoid scrutiny from US tech policy makers and avoid potential tech sanctions that would complicate things.

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Do we see how far china has comes ?
We have arrived to a situation whereby China has to purposely keep quiet on their accomplishment in order not to agitate America.
America, as the exceptional and indispensable superpower, has been to reduced to state that China has to sympathise for her feeling.
And that is how a superpower should be ?
 
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