Chinese semiconductor industry


ansy1968

Colonel
Registered Member
Again perfect timing It didn't mentioned the SSMB per se But with news publication coming from China you need to read between the lines and understand what it meant. The key words is CAS (China Academy of Science) and the other is a new type of particle accelerator light source "steady-state micro-bunching" :cool: and also regarding the news headline it's to optimistic, I follow the opinion of @Oldschool that in 2025 we may see a Chinese EUVL in operation powered by CAS SSMB.

EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast​

2022-01-13 22:12 HKT

Chip manufacturing has always been the biggest shortcoming of the domestic semiconductor industry, and most of the chips we use, about 50% are purchased from the United States at high prices. According to statistics, from 2019 to 2020, Chinese chips The total amount of imports exceeds 300 billion, accounting for about 40% of the global semiconductor consumer market, far exceeding oil!


However, the old American, who has made a lot of money from the Chinese market, hates the rise of domestic high-tech companies such as Huawei. Industrial channels have caused Huawei HiSkong to have top-notch chip design skills, but it is useless.
The reason why we are trapped in the chip ban is largely due to the lack of EUV lithography equipment. However, ASML, the only Dutch giant that can produce EUV equipment in the world, is restricted by "export control" due to the American technology accessories contained in its production line, so that it has never been able to sell the equipment to us.

EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast

After Huawei was cut off, Ren Zhengfei visited the Chinese Academy of Sciences for help. The two sides reached a clear consensus: The key to breaking the ice of domestic chips is the EUV lithography machine.
In order to realize the rise of "China Core", the Chinese Academy of Sciences took the initiative to take over the task and established a special EUV core technology research team, which is bound to complete the breakthrough in the shortest time.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


Unexpectedly, when ASML learned that we were going to develop EUV on our own, they would sneer and say: Even if they give Chinese drawings, they will make them. Although engineering academician Wu Hanming also said: EUV is the crystallization of global wisdom, it is very unrealistic for us to research and develop on our own.
However, in the face of Lao Mei's bottom-line suppression, we who are "stucked" have no room to "retire" at all. More importantly, the development of EUV is not only to clear the obstacles on the road to localization of chips, but also to safeguard the dignity of the nation!
Therefore, any doubts and ridicules cannot obliterate the determination of Chinese scientists to break through the EUV monopoly.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


Sure enough, the good news came soon. Huazhuo Precision Technology took the lead and independently developed a dual-stage system, one of the core technologies of EUV, and became the second company in the world to master this technology after ASML.
Witnessing China's R&D progress in the field of lithography, ASML, which once poured cold water, also immediately changed its tune. Not only did it show its favor to the Chinese market five times, it even began to “snatch”, saying: If the United States continues sanctions, China will be alone within 15 years. Created EUV lithography machine.


However, ASML obviously still underestimated the perseverance and strength of Chinese scientists, and never expected it to be so fast. In just one year, China's EUV lithography machine was about to land.

In addition to the dual work stage system, EUV equipment has two core technologies, namely the light source and the optical lens.
In terms of light sources, the scientific research team led by Professor Tang Chuanxiang of Tsinghua University successfully explored a new type of particle accelerator light source "steady-state micro-bunching" in February this year. Ultraviolet light is the working light source of EUV. What's more commendable is that China's independent light source technology is not only suitable for EUV, but also has a wider range of application scenarios.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast

Only less than 6 months later, CCTV reported great news related to optical lenses.

The first domestic high-energy radiation light source equipment independently developed by the Chinese Academy of Sciences has officially completed the installation and application.
At the same time, the linear Lloyd lens coating device and nano-focusing lens coating device developed by Zhongke Kemei have also been put into use.
These two devices combined with high-radiation light source equipment can almost meet the physical lens technology of all process requirements, including Zeiss lenses.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


This means that the three core technologies of EUV lithography machines have all been broken, and the Chinese Academy of Sciences has also fulfilled its promise.
Although EUV claims to have more than 100,000 precision parts, it has not yet broken through, but can it be more aircraft carriers? This is not a big problem for the huge Chinese manufacturing market.
Looking back over the past seventy years, under the blockade of the West, China's scientific and technological development road has been very bumpy, but it has never stopped. One by one, the first achievements are coming. One super project has won the world, and scientific breakthroughs have benefited mankind. "Turning in circles, competing with hundreds of rivers" is the most appropriate description of China's science and technology. What is the point of a small EUV lithography machine?
 
Last edited:

Overbom

Colonel
Registered Member
Again perfect timing It didn't mentioned the SSMB per se But with news publication coming from China you need to read between the lines and understand what it meant. The key words is CAS (China Academy of Science) and the other is a new type of particle accelerator light source "steady-state micro-bunching" :cool: and also regarding the news headline it's to optimistic, I follow the opinion of @Oldschool that in 2025 we may see a Chinese EUVL in operation powered by CAS SSMB.

EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast​

2022-01-13 22:12 HKT

Chip manufacturing has always been the biggest shortcoming of the domestic semiconductor industry, and most of the chips we use, about 50% are purchased from the United States at high prices. According to statistics, from 2019 to 2020, Chinese chips The total amount of imports exceeds 300 billion, accounting for about 40% of the global semiconductor consumer market, far exceeding oil!


However, the old American, who has made a lot of money from the Chinese market, hates the rise of domestic high-tech companies such as Huawei. Industrial channels have caused Huawei HiSkong to have top-notch chip design skills, but it is useless.
The reason why we are trapped in the chip ban is largely due to the lack of EUV lithography equipment. However, ASML, the only Dutch giant that can produce EUV equipment in the world, is restricted by "export control" due to the American technology accessories contained in its production line, so that it has never been able to sell the equipment to us.

EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast

After Huawei was cut off, Ren Zhengfei visited the Chinese Academy of Sciences for help. The two sides reached a clear consensus: The key to breaking the ice of domestic chips is the EUV lithography machine.
In order to realize the rise of "China Core", the Chinese Academy of Sciences took the initiative to take over the task and established a special EUV core technology research team, which is bound to complete the breakthrough in the shortest time.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


Unexpectedly, when ASML learned that we were going to develop EUV on our own, they would sneer and say: Even if they give Chinese drawings, they will make them. Although engineering academician Wu Hanming also said: EUV is the crystallization of global wisdom, it is very unrealistic for us to research and develop on our own.
However, in the face of Lao Mei's bottom-line suppression, we who are "stucked" have no room to "retire" at all. More importantly, the development of EUV is not only to clear the obstacles on the road to localization of chips, but also to safeguard the dignity of the nation!
Therefore, any doubts and ridicules cannot obliterate the determination of Chinese scientists to break through the EUV monopoly.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


Sure enough, the good news came soon. Huazhuo Precision Technology took the lead and independently developed a dual-stage system, one of the core technologies of EUV, and became the second company in the world to master this technology after ASML.
Witnessing China's R&D progress in the field of lithography, ASML, which once poured cold water, also immediately changed its tune. Not only did it show its favor to the Chinese market five times, it even began to “snatch”, saying: If the United States continues sanctions, China will be alone within 15 years. Created EUV lithography machine.


However, ASML obviously still underestimated the perseverance and strength of Chinese scientists, and never expected it to be so fast. In just one year, China's EUV lithography machine was about to land.

In addition to the dual work stage system, EUV equipment has two core technologies, namely the light source and the optical lens.
In terms of light sources, the scientific research team led by Professor Tang Chuanxiang of Tsinghua University successfully explored a new type of particle accelerator light source "steady-state micro-bunching" in February this year. Ultraviolet light is the working light source of EUV. What's more commendable is that China's independent light source technology is not only suitable for EUV, but also has a wider range of application scenarios.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast

Only less than 6 months later, CCTV reported great news related to optical lenses.

The first domestic high-energy radiation light source equipment independently developed by the Chinese Academy of Sciences has officially completed the installation and application.
At the same time, the linear Lloyd lens coating device and nano-focusing lens coating device developed by Zhongke Kemei have also been put into use.
These two devices combined with high-radiation light source equipment can almost meet the physical lens technology of all process requirements, including Zeiss lenses.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


This means that the three core technologies of EUV lithography machines have all been broken, and the Chinese Academy of Sciences has also fulfilled its promise.
Although EUV claims to have more than 100,000 precision parts, it has not yet broken through, but can it be more aircraft carriers? This is not a big problem for the huge Chinese manufacturing market.
Looking back over the past seventy years, under the blockade of the West, China's scientific and technological development road has been very bumpy, but it has never stopped. One by one, the first achievements are coming. One super project has won the world, and scientific breakthroughs have benefited mankind. "Turning in circles, competing with hundreds of rivers" is the most appropriate description of China's science and technology. What is the point of a small EUV lithography machine?
Article makes it seem that the EUV is closer than we thought
 

ansy1968

Colonel
Registered Member
Article makes it seem that the EUV is closer than we thought
@Overbom Yup BUT the article is correct regarding the breakthroughs BUT the Timeline is too optimistic...lol, we have to wait until they finished the SSMB construction in 2025. I think the article meaning of delivery is that they finished the project not the product itself. (due to construction constraint). And @WTAN Sir an Official confirmation? Seems like they're confident on going the SSMB route?
 

Hyper

Junior Member
Registered Member
Ha
Again perfect timing It didn't mentioned the SSMB per se But with news publication coming from China you need to read between the lines and understand what it meant. The key words is CAS (China Academy of Science) and the other is a new type of particle accelerator light source "steady-state micro-bunching" :cool: and also regarding the news headline it's to optimistic, I follow the opinion of @Oldschool that in 2025 we may see a Chinese EUVL in operation powered by CAS SSMB.

EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast​

2022-01-13 22:12 HKT

Chip manufacturing has always been the biggest shortcoming of the domestic semiconductor industry, and most of the chips we use, about 50% are purchased from the United States at high prices. According to statistics, from 2019 to 2020, Chinese chips The total amount of imports exceeds 300 billion, accounting for about 40% of the global semiconductor consumer market, far exceeding oil!


However, the old American, who has made a lot of money from the Chinese market, hates the rise of domestic high-tech companies such as Huawei. Industrial channels have caused Huawei HiSkong to have top-notch chip design skills, but it is useless.
The reason why we are trapped in the chip ban is largely due to the lack of EUV lithography equipment. However, ASML, the only Dutch giant that can produce EUV equipment in the world, is restricted by "export control" due to the American technology accessories contained in its production line, so that it has never been able to sell the equipment to us.

EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast

After Huawei was cut off, Ren Zhengfei visited the Chinese Academy of Sciences for help. The two sides reached a clear consensus: The key to breaking the ice of domestic chips is the EUV lithography machine.
In order to realize the rise of "China Core", the Chinese Academy of Sciences took the initiative to take over the task and established a special EUV core technology research team, which is bound to complete the breakthrough in the shortest time.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


Unexpectedly, when ASML learned that we were going to develop EUV on our own, they would sneer and say: Even if they give Chinese drawings, they will make them. Although engineering academician Wu Hanming also said: EUV is the crystallization of global wisdom, it is very unrealistic for us to research and develop on our own.
However, in the face of Lao Mei's bottom-line suppression, we who are "stucked" have no room to "retire" at all. More importantly, the development of EUV is not only to clear the obstacles on the road to localization of chips, but also to safeguard the dignity of the nation!
Therefore, any doubts and ridicules cannot obliterate the determination of Chinese scientists to break through the EUV monopoly.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


Sure enough, the good news came soon. Huazhuo Precision Technology took the lead and independently developed a dual-stage system, one of the core technologies of EUV, and became the second company in the world to master this technology after ASML.
Witnessing China's R&D progress in the field of lithography, ASML, which once poured cold water, also immediately changed its tune. Not only did it show its favor to the Chinese market five times, it even began to “snatch”, saying: If the United States continues sanctions, China will be alone within 15 years. Created EUV lithography machine.


However, ASML obviously still underestimated the perseverance and strength of Chinese scientists, and never expected it to be so fast. In just one year, China's EUV lithography machine was about to land.

In addition to the dual work stage system, EUV equipment has two core technologies, namely the light source and the optical lens.
In terms of light sources, the scientific research team led by Professor Tang Chuanxiang of Tsinghua University successfully explored a new type of particle accelerator light source "steady-state micro-bunching" in February this year. Ultraviolet light is the working light source of EUV. What's more commendable is that China's independent light source technology is not only suitable for EUV, but also has a wider range of application scenarios.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast

Only less than 6 months later, CCTV reported great news related to optical lenses.

The first domestic high-energy radiation light source equipment independently developed by the Chinese Academy of Sciences has officially completed the installation and application.
At the same time, the linear Lloyd lens coating device and nano-focusing lens coating device developed by Zhongke Kemei have also been put into use.
These two devices combined with high-radiation light source equipment can almost meet the physical lens technology of all process requirements, including Zeiss lenses.
EUV lithography machine announced a breakthrough, Chinese Academy of Sciences fulfilled its promise, ASML did not expect it to be so fast


This means that the three core technologies of EUV lithography machines have all been broken, and the Chinese Academy of Sciences has also fulfilled its promise.
Although EUV claims to have more than 100,000 precision parts, it has not yet broken through, but can it be more aircraft carriers? This is not a big problem for the huge Chinese manufacturing market.
Looking back over the past seventy years, under the blockade of the West, China's scientific and technological development road has been very bumpy, but it has never stopped. One by one, the first achievements are coming. One super project has won the world, and scientific breakthroughs have benefited mankind. "Turning in circles, competing with hundreds of rivers" is the most appropriate description of China's science and technology. What is the point of a small EUV lithography machine?
This has been reported months ago . This was reported in that equalocean article.Why is everyone reporting the same news again and again. The news about Beijing UPrecision is old .
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› analysis
Deep Dive: SMEE and China's Attempt to Replace ASML Tools
 

Hyper

Junior Member
Registered Member
@Overbom Yup BUT the article is correct regarding the breakthroughs BUT the Timeline is too optimistic...lol, we have to wait until they finished the SSMB construction in 2025. I think the article meaning of delivery is that they finished the project not the product itself. (due to construction constraint). And @WTAN Sir an Official confirmation? Seems like they're confident on going the SSMB route?
SSMB is extremely expensive and it is not easy to assemble synchrotron or FELs .
If you ask me it seems to an amazing step forward for synchrotron light sources but not really viable for semiconductor manufacturing.
Construction of a storage ring is too expensive and tedious . It will be used for pure research but at an industrial scale it is very impractical.
 

FairAndUnbiased

Captain
Registered Member
SSMB is extremely expensive and it is not easy to assemble synchrotron or FELs .
If you ask me it seems to an amazing step forward for synchrotron light sources but not really viable for semiconductor manufacturing.
Construction of a storage ring is too expensive and tedious . It will be used for pure research but at an industrial scale it is very impractical.
Depends. The business model will be that wafers are processed at publically owned synchrotrons which provides EUV for a fee to multiple end user stations. The final user is responsible for their own end stations, either a moderate fee (moderate for businesses, not for individuals) mobile station or a higher fee for a permanent station that they rent in long term contracts, like real estate.

Each synchrotron ring can serve dozens of clients.

Even if each client spends $4 million per year on renting the EUV light, has a $50 million optics + exposure + stage and spends $1 million per year on packaging and shipping wafers out for finishing, it'll still be cheaper than buying their own EUV lithography machine for 20 years of use. And they'll only be responsible for maintaining the optics and stage, not the EUV source.
 

tokenanalyst

Senior Member
Registered Member
SSMB is extremely expensive and it is not easy to assemble synchrotron or FELs .
If you ask me it seems to an amazing step forward for synchrotron light sources but not really viable for semiconductor manufacturing.
Construction of a storage ring is too expensive and tedious . It will be used for pure research but at an industrial scale it is very impractical.
In reality researchers working in SSMB have been selling this technology as a cost effective alternative for EUV light sources.
1642100875488.png
1 Kw is a good amount of usable EUV energy for printing ultra dense patterns in a photo-resist.
 

Overbom

Colonel
Registered Member
In reality researchers working in SSMB have been selling this technology as a cost effective alternative for EUV light sources.
View attachment 81172
1 Kw is a good amount of usable EUV energy for printing ultra dense patterns in a photo-resist.
Seems like it is the ideal light source for EUV

How about any disadvantages
(aside from r&d -> commercialisation risk)
 
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tokenanalyst

Senior Member
Registered Member
I personally do not like to hype, but this is pretty interesting stuff in theory it can be a really good alternative for lasers and dirty plasma ligth, Lithography could become more like particle physics like ion implantation. If this work, because of the collaboration between China and Germany there is not doubt ASML could use the technology in some time in the future.
 

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