AMIES first 350nm stepper lithography machine from Chip-on-Micro was officially shipped.
Shanghai AMIES Semiconductor Manufacturing Co., Ltd. (AMIES), under its brand *Chip-on-Micro*, has successfully delivered its first independently developed 350nm stepper lithography machine, the AST6200, marking a major milestone in China’s pursuit of self-reliance in high-end semiconductor equipment.
AST6200 Stepper Lithography Machine
The AST6200 is a fully autonomous, high-performance, and high-precision stepper lithography system designed specifically for advanced compound semiconductor manufacturing including power devices, radio frequency (RF) front-ends, optoelectronics, and Micro LED displays.
Technical Features:
350nm Resolution: Achieved via a large numerical aperture projection lens and advanced illumination modes (variable pupil technology), enabling precise patterning for current mainstream compound semiconductor chips.
High Overlay Accuracy:
80nm front-side overlay
500nm back-side overlay
Ensures precision in multi-layer chip fabrication, improving device yield and reliability.
High Productivity & Efficiency:
High-intensity I-line (365nm) light source
Fast linear motor system supporting rapid switching between substrate sizes (2", 3", 4", 6", 8")
Motion table with up to 1.5g acceleration, boosting throughput and reducing cycle times.
Broad Process Flexibility:
Compatible with diverse materials: Si, SiC, InP, GaAs, sapphire
Supports various substrate types (flat edge, double flat edge, notch)
Innovative multi-spot, wide-angle focusing system enables accurate alignment on transparent, translucent, and large-step substrates
Back-side alignment module for complex bonding processes (e.g., wafer-level stacking)
Full Domestic Autonomy:
- 100% independently developed software stack from hardware drivers to process control enabling remote operation, real-time monitoring, and intelligent lifecycle management.
- Fully controllable, scalable system that supports future upgrades and integration into smart manufacturing ecosystems.
80nm overlay for 350nm is quite good. The overlay requirement for a 350nm process node is about 120nm, I expect them to reach KrF steppers pretty soon.