They are weaponized tools that are like drugs to industry. I know that analogy couldn't have flew over your head like that.
Chinese companies having access to ASML machines (are currently better) will improve the competitiveness of China's semiconductor fabs. That has direct consequences downstream, from the production of semiconductors and finally to the software stack. This will directly benefit Chinese 6G and AI development for example.
Yes, that will likely mean fewer sales of Chinese machines at the beginning, but I see the downstream benefits being far greater.
And the key point is that this doesn't slow down the development of Chinese lithography machines, because:
1. Chinese companies like SMEE, SMIC and Huawei know that know that the supply of machines will likely be restricted again.
2. Once they develop competitive DUV/EUV machines, they will likely have a large price/performance advantage, and these companies will dominate the industry in the future, along with the profits.
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If you really want to use a drug analogy, then the drug addict knows he can't reply on an external supply of drugs. So he has to develop one himself. It may not be as good or inexpensive as his current supplier, but it will do for now. And it will likely be better and cheaper than the external alternative in the coming years.
As to the nature of this drug, it is legal and results in a lifetime performance boost (versus your competitors) because lithography machines last decades, and ASML versions are currently cheaper and better.
No. Easy route is to buy foreign, and make profits while becoming dependent on them.
Like with older generation lithography machines, we will likely see 3rd party companies emerge which can service and maintain DUV and EUV machines from ASML. There doesn't have to be dependence.
OK so you want there to be no other competitors in China, right? Or you want to insert ASML so they know they can't charge high profits and see reason to give up or not invest? It seems like you're arguing against yourself.
We currently have 2 competitive suppliers for DUV machines (ASML and Nikon). And Nikon isn't doing very well with only 10% of the market. Realistically, there is only space in the market for a single competitive Chinese DUV supplier.
But I expect DUV machines to be available to every fab in China (and indeed overseas), because the government is sponsoring a lot of this development. The government want Chinese DUV machines to be used everywhere.
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With EUV, the market is even smaller. So there is currently only ASML. Again, realistically, there is only space for a single competitive Chinese EUV supplier. But you have the same dynamics as above.
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As for the profits, look at each step of the current structure:
ASML lithography machines: ~100%? profit margin
TSMC semiconductor fab: ~100%? profit margin
NVidia AI chips: ~800%? profit margin
So you can see:
1. There is a lot of excess profit for Chinese competitors to work with. I expect Chinese lithography machines to take a huge slice of the global sales in the future, due to lower prices and then better technology
2. If the profit margins for lithography machines drop, it has a huge impact on the cost of finished semiconductors
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As for ASML making future lithography investments:
1. They already have a mature EUV lithography design. At this point, ASML spending on EUV/DUV is more about incremental improvements which don't cost that much in terms of spending.
2. In terms of next-generation semiconductor technology research to replace EUV, China is far ahead of anyone else. Nature reports that China is double US output. The TSMC Chief Scientist (based in California) says China is where all this research is happening.
Yes, additional sales to ASML will increase their profits. But I don't see it making any difference to their R&D spending on existing DUV/EUV technology. And in the competition for next-gen semiconductors (10+ years away), I think Chinese companies already has a commanding lead and will be the first to commercialise.
It's an unsupported hope. I explained the mechanism that debugging is faster the more you use it. So using it less debugs it slower.
I don't see it that way. Initial debugging of a new DUV lithography machine design is still part of the initial development timescale. You can have twice as many machines in operation, throwing up twice as many problems. But the constraint is still a single development team in charge of the lithography machine design.
After a certain threshold for the size of the development team, throwing more people and resources is unnecessary and arguably counterproductive. It just introduces more complexity and delays into the design/update process.
I think that China has many approaches to this and the prototypes are in deep development. It is extremely difficult to reverse-engineer one of those things and to adapt its approach to your approach. We don't need that distraction. We are not chasing them like ICE cars; we are developing our own leap-frog tech like in EVs.
Agreed. But it would be so useful to have a EUV machine to compare and benchmark against.
And it's not about reverse engineering the entire machine.
It's about understanding the components, and where the gaps are.
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I feel this conversation is better off in the semi-conductor thread, where many of these points have already been made