It could also be that US citizens are subject to US taxes, no matter where they live or die. US estate (inheritance) tax is 40% for amounts above ~$14M while China does not currently have an estate tax.
Chinese semiconductor thread II
- Thread starter vincent
- Start date
Better that than get the Little Yangtze treatment at age 85…
There have been to hit soon-to-be former US citizens with what would effectively be a significant, if not punitive exit tax on a sizable portion, if not the totality of their net worth.
However, for better or worse, such proposals have yet to be legislated into law.
The "one time tax" you speak of primarily affects unrealized capital gains, which can be sizable and problematic, or negligible depending on how you've managed your investments.
However, even if you renounce your US citizenship, chances are the IRS will continue to tax you so long as you retain income generating assets in the US.
Oriental Jingyuan has shipped over 60 electron beam equipments. What are the strengths behind it?
Oriental Jingyuan's electron beam quantity detection equipment has exceeded the milestone of 60 units, which means that the technical performance of Oriental Jingyuan's equipment in this field has been stabilized and recognized by users, and can meet the production needs of semiconductor manufacturing companies. The relevant market is expected to usher in a breakthrough growth. According to the industry's first information disclosure, Oriental Jingyuan, as a leading company in the field of integrated circuit yield management, has delivered a total of 60 electron beam equipment. This marks that domestic high-end quantity detection equipment has made substantial progress in terms of technical maturity and production line adaptability. Behind this data, it reflects the strategic shift of the domestic semiconductor industry chain. In recent years, international geopolitical fluctuations have continued to catalyze the process of domestic equipment substitution. In order to avoid the risk of supply interruption, wafer fabs have accelerated the introduction of local solutions. Oriental Jingyuan shoulders the heavy responsibility of domestic substitution and deeply participates in independent innovation in key areas. The company's more than ten years of accumulated experience in the research and development of electronic optical systems and mass production have made it the core force to solve the problem of "stuck neck" of semiconductor equipment.
Although the US government has continuously upgraded its export controls on China in an attempt to slow down the development of my country's advanced processes, this cannot stop the development and progress of China's semiconductor industry. Oriental Jingyuan's technological breakthroughs have not only reshaped the market structure of domestic equipment in the yield management link, but also provided a key puzzle piece for China's semiconductor industry to build a technological moat. In terms of improving the independent and controllable capabilities of China's semiconductor industry, Oriental Jingyuan will continue to make important contributions.
the user groups that have shipped the machines include logic manufacturers, storage manufacturers, advanced packaging and third-generation semiconductor manufacturers, and the cumulative wafer move volume exceeds 560,000 pieces. The 12-inch equipment has been put into service on the 28nm production line, and the 6-inch and 8-inch equipment are running as BSL machines in the third-generation semiconductor field. "It is worth mentioning that we have begun to receive repeat orders from some users. This is the market's recognition of us, and the company will continue to invest in research and development and make more innovations." He said.
Electron beam defect detection equipment is a more mature product line of Oriental Jingyuan, which can detect not only electrical defects but also physical defects. After several years of research and development iterations, the main models have been further expanded in terms of detection capabilities and application scenarios. Resolution is one of the core indicators of EBI. The Oriental Jingyuan R&D team has effectively improved the resolution level of EBI equipment through systematic improvements and optimizations: adopting a high-voltage, low-aberration electron optical system design to achieve higher imaging resolution; optimizing the performance and connection methods of EE modules to effectively suppress noise; and developing vibration dynamic compensation technology to suppress the impact of mechanical vibration on imaging.
Shandong University/Jingga Semiconductor· Successfully developed 4-inch high-quality GaN single crystal substrate
Gallium nitride (GaN) crystals, as a representative material of the third-generation wide bandgap semiconductors, have excellent properties such as wide bandgap, high breakdown voltage, high thermal conductivity, and strong radiation resistance. They have important applications in the fields of blue-green lasers, active phased array radars, and power electronic devices. The HVPE method is currently the mainstream method for commercial preparation of large-size GaN single crystal substrates due to its advantages such as mild growth conditions, fast growth rate, large growth size, and controllable doping. However, the problems of stress concentration and dislocation extension caused by lattice mismatch and differences in thermal expansion coefficients on heterogeneous substrates have always been a bottleneck restricting the reliability of GaN devices, directly affecting the working life of the devices.The Journal of Synthetic Crystals, Vol. 54, No. 4, 2025 (published online first), published a research bulletin titled " Preparation of 4-inch high-quality GaN single crystal substrates " (first author: Qi Zhanguo ; corresponding authors: Wang Shouzhi, Zhang Lei ), reporting a major breakthrough made by Shandong University and Shandong Jinggai Semiconductor Co., Ltd. in the preparation of 4-inch high-quality GaN single crystal substrates. The paper successfully prepared 4-inch high-quality GaN single crystal substrates using a unique porous substrate technology, with a dislocation density as low as ~9.6×10 5 cm -2 . The technological breakthrough and large-scale production of 4-inch GaN substrates are of great significance to the development of GaN-based devices (such as blue-green lasers and power electronic devices).
Enhancing lithographic accuracy by mitigating overlay errors via mask-induced thermal and mechanical optimization
Abstract
As technology nodes continue to shrink, the demand for higher lithographic accuracy in integrated circuit fabrication intensifies. To address the limitations of traditional compensation methods, this study proposes a mask-induced thermal and mechanical optimization approach to mitigate overlay errors, thereby enhancing lithographic precision in emerging techniques such as nanoimprint lithography (NIL) and surface plasmon lithography (SPL). This approach integrates stress application schemes with localized thermal effects, resulting in a range of compensation strategies based on mask-induced thermal-mechanical coupling. Through mathematical modeling and moment balance assumptions, the technique leverages the linear superposition property for overlay error compensation and identifies 20 key compensation parameters through statistical analysis and optimization algorithms. Experimental validation demonstrates that the compensation effectiveness for completely random, linear, quadratic, and higher-order overlay errors reaches 89.18%, 93.05%, 64.75%, and 53.89%, respectively. In 24 rounds of random testing, the average compensation in the X and Y directions was 91.98%, showing strong stability and consistency. Furthermore, finite element method (FEM) simulations validate the model, revealing a residual overlay error compensation of less than 0.2 nm, with a calculation-to-validation discrepancy under 0.9%, confirming the model's accuracy. This technology provides a reliable solution for overlay error compensation in emerging lithographic techniques like lensless SPL and NIL and offers valuable insights for future research in extreme ultraviolet lithography (EUVL) and deep ultraviolet lithography (DUVL), with potential applications in integrated circuit lithography and further validation across various mask types and complex exposure areas.
Maolai Optics expanding investment to become a bigger supplier of high precision optics components and ultra-precise interferometers for lithography machines.
Maolai Optical , as a provider of comprehensive solutions for precision optics, focuses on the research and development, design, manufacturing and sales of precision optical devices, optical lenses and optical systems. Maolai Optical focuses on providing customers with integrated solutions of "light, machinery, electricity and computing". It has now formed optical design capabilities covering ultraviolet to infrared spectrum, high-precision optical device manufacturing capabilities, multi-variable active adjustment capabilities of optical lenses and systems, and vertical integration capabilities of optical systems. The main products
of Maolai Optics cover the full spectrum from deep ultraviolet DUV, visible light to far infrared, mainly including three categories: precision optical devices, optical lenses and optical systems: 1. Precision optical devices. Maolai Optics ' precision optical devices have the characteristics of high surface shape, high finish and high performance coating index, which can be applied to major national strategic development fields such as lithography machines, high-resolution satellites, lunar exploration projects, civil aircraft, etc. 2. Precision optical lenses.
1. Ultra-precision optical production and processing project
(1) Project overview
This project is jointly implemented by Nanjing Maolai Optical Technology Co., Ltd. and its wholly-owned subsidiary Nanjing Maolai Precision Measurement System Co., Ltd. The construction site is located at Nanjing City, Jiangsu Province, and the land west of Jinxin East Road and north of Tangjia Road in Jiangning Development Zone, Nanjing City, Jiangsu Province. The total investment is RMB 417,461,800, and the proposed use of the raised funds shall not exceed RMB 417,461,800. After the completion of this project, the company can achieve mass production capacity of ultra-precision optical devices and objective lenses.
This project is an important guarantee for the company to expand its market share in the field of ultra-precision optics in semiconductors . Ultra-precision optical components have high customer verification thresholds and are difficult to mass produce. Suppliers with first-mover advantages will achieve extremely high customer stickiness and are expected to build a long-term and deep business moat.
Against this background, relying on its long-term deep technical accumulation and forward-looking R&D investment, the company has completed the prototype development of ultra-precision optical devices and objective lenses. The next step is to help the company achieve mass production of ultra-precision optical devices and objective lenses through the implementation of this project, and achieve the leading technical capabilities and industrialization capabilities of new products in the industry. While meeting the urgent supply needs of various downstream markets for ultra-precision optical components, it always maintains its leading position as a supplier of ultra-precision optical products in strategic emerging fields.
This project is a necessary measure for the company to consolidate its leading position in ultra-precision optical products
. In addition to its application in the semiconductor field, ultra-precision optical products also play an important role in high-precision optical fields such as industrial measurement, aerospace, and life sciences due to their stringent requirements for manufacturing accuracy, material properties, technical parameters, consistency and stability. The technical verification of ultra-precision optical components has a high threshold and a long period, and the industrial supply capacity has also become an important test; at the same time, its mass production has extremely stringent requirements on production environment, production equipment, production experience, etc., and the production ramp-up period is long. It is necessary to invest a lot of manpower, material resources, and time in advance to continuously optimize various production processes to ensure the optical performance, consistency and stability of the products, so as to fully meet the downstream mass production requirements.
2. Ultra-precision optical technology R&D center project
(1) Project overview
This project is jointly implemented by Nanjing Maolai Optical Technology Co., Ltd. and its wholly-owned subsidiary Nanjing Maolai Precision Measurement System Co., Ltd. The construction site is located at Nanjing City, Jiangsu Province. The total investment is RMB 124,638,000, and the proposed use of raised funds is no more than RMB 122,538,200. After the completion of this project, a series of high-standard laboratories will be formed, and on this basis, the focus will be on the research and development and improvement of technical topics such as high-precision interferometer measurement method research, large-aperture aspheric lens measurement method research, and ultra-precision optical device processing and measurement method research.
(2) Necessity of project implementation
This R&D project includes three sub-research topics, namely, high-precision interferometer measurement method research, large-aperture aspheric lens measurement method research, and ultra-precision optical device processing and measurement method research, which are jointly committed to improving the company's step-by-step development of the technical level in the field of optical measurement and processing.
Maolai Optics (688502): Nanjing Maolai Optical Technology Co., Ltd.'s statement on the investment of the raised funds in the field of technological.
Maolai Optical , as a provider of comprehensive solutions for precision optics, focuses on the research and development, design, manufacturing and sales of precision optical devices, optical lenses and optical systems. Maolai Optical focuses on providing customers with integrated solutions of "light, machinery, electricity and computing". It has now formed optical design capabilities covering ultraviolet to infrared spectrum, high-precision optical device manufacturing capabilities, multi-variable active adjustment capabilities of optical lenses and systems, and vertical integration capabilities of optical systems. The main products
of Maolai Optics cover the full spectrum from deep ultraviolet DUV, visible light to far infrared, mainly including three categories: precision optical devices, optical lenses and optical systems: 1. Precision optical devices. Maolai Optics ' precision optical devices have the characteristics of high surface shape, high finish and high performance coating index, which can be applied to major national strategic development fields such as lithography machines, high-resolution satellites, lunar exploration projects, civil aircraft, etc. 2. Precision optical lenses.
1. Ultra-precision optical production and processing project
(1) Project overview
This project is jointly implemented by Nanjing Maolai Optical Technology Co., Ltd. and its wholly-owned subsidiary Nanjing Maolai Precision Measurement System Co., Ltd. The construction site is located at Nanjing City, Jiangsu Province, and the land west of Jinxin East Road and north of Tangjia Road in Jiangning Development Zone, Nanjing City, Jiangsu Province. The total investment is RMB 417,461,800, and the proposed use of the raised funds shall not exceed RMB 417,461,800. After the completion of this project, the company can achieve mass production capacity of ultra-precision optical devices and objective lenses.
This project is an important guarantee for the company to expand its market share in the field of ultra-precision optics in semiconductors . Ultra-precision optical components have high customer verification thresholds and are difficult to mass produce. Suppliers with first-mover advantages will achieve extremely high customer stickiness and are expected to build a long-term and deep business moat.
Against this background, relying on its long-term deep technical accumulation and forward-looking R&D investment, the company has completed the prototype development of ultra-precision optical devices and objective lenses. The next step is to help the company achieve mass production of ultra-precision optical devices and objective lenses through the implementation of this project, and achieve the leading technical capabilities and industrialization capabilities of new products in the industry. While meeting the urgent supply needs of various downstream markets for ultra-precision optical components, it always maintains its leading position as a supplier of ultra-precision optical products in strategic emerging fields.
This project is a necessary measure for the company to consolidate its leading position in ultra-precision optical products
. In addition to its application in the semiconductor field, ultra-precision optical products also play an important role in high-precision optical fields such as industrial measurement, aerospace, and life sciences due to their stringent requirements for manufacturing accuracy, material properties, technical parameters, consistency and stability. The technical verification of ultra-precision optical components has a high threshold and a long period, and the industrial supply capacity has also become an important test; at the same time, its mass production has extremely stringent requirements on production environment, production equipment, production experience, etc., and the production ramp-up period is long. It is necessary to invest a lot of manpower, material resources, and time in advance to continuously optimize various production processes to ensure the optical performance, consistency and stability of the products, so as to fully meet the downstream mass production requirements.
2. Ultra-precision optical technology R&D center project
(1) Project overview
This project is jointly implemented by Nanjing Maolai Optical Technology Co., Ltd. and its wholly-owned subsidiary Nanjing Maolai Precision Measurement System Co., Ltd. The construction site is located at Nanjing City, Jiangsu Province. The total investment is RMB 124,638,000, and the proposed use of raised funds is no more than RMB 122,538,200. After the completion of this project, a series of high-standard laboratories will be formed, and on this basis, the focus will be on the research and development and improvement of technical topics such as high-precision interferometer measurement method research, large-aperture aspheric lens measurement method research, and ultra-precision optical device processing and measurement method research.
(2) Necessity of project implementation
This R&D project includes three sub-research topics, namely, high-precision interferometer measurement method research, large-aperture aspheric lens measurement method research, and ultra-precision optical device processing and measurement method research, which are jointly committed to improving the company's step-by-step development of the technical level in the field of optical measurement and processing.
CloudMatrix is not a chip, it's a rack scale architecture just like Nvidia's Grace Blackwell series. That is to say, both of them are preconfigured systems made up of 100+ chips linked together in a specific network topology. The GPUs in question here are Ascend 910Cs.
And speaking of Huawei, they are well positioned to capture more market share from Nvidia thanks to new restrictions.