Don't buy what you can source domestically of very similar or the same quality except if the sellers sell them for a loss. They should have been ready to sell those things long before a domestic competitor came on the scene.I'd bet SMEE will get it first before Nikon. Nikon would want to sell it to China, the big question is whether China would buy it
Do you know what, once SMEE manage to produce it, ASML would rush selling its best DUV TWINSCAN NXT:2050i to China with a huge discount, not sure who would buy the Nikon one (if successful at all)
200 WPH is pretty standard. With multi patterning you may need to run it multiple times through the machine? Eg 7 times for 7nm with DUV?To the experts, It said 200 wafers per hour, if we do the math A single SMEE DUVL can produced 4800 wafers per day and 144,000 per month? Is the computation correct cause it seems to excessive for a single machine to perform? Do the DUVL machine operates 24 hour a day? and from the news I got most medium side FAB like the SMIC Chengdu is advertise between 25,000 to 40,000 wafer capacity per month, need your expert opinion coming from a novice nuisance.
SMIC Chengdu foundry, using Shanghai microlithography machine SSA800/10W immersion lithography machine parameters: lens NA: 1.35 single exposure resolution: 38-41nm dual workpiece stage: DWSi, the production rate is 200 wafers per hour Circle engraving accuracy: better than 2.5nm Design index: can meet the 28nm planar planner transistor logic circuit process requirements under a single exposure condition