Chinese semiconductor industry

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WTAN

Junior Member
Registered Member
Some news on Chinese development of LPP EUVL in Shanghai.

SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.

Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.
 

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ZeEa5KPul

Colonel
Registered Member
Some news on Chinese development of LPP EUVL in Shanghai.

SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.

Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.
Oh, hell yeah, son! This is the kind of news I was waiting to see in this thread.
 

dfrtyhgj

Junior Member
Registered Member
Some news on Chinese development of LPP EUVL in Shanghai.

SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.

Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.
China needs to localize that Spiricon software used.
 

xypher

Senior Member
Registered Member
Some news on Chinese development of LPP EUVL in Shanghai.

SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.

Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.

Fantastic news!
 

Vichysoy

New Member
Registered Member
Some news on Chinese development of LPP EUVL in Shanghai.

SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.

Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.
excuse me ! can you tell me when was this paper published ?
 

ansy1968

Brigadier
Registered Member
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